Inventor · disambiguated record
Mineo Nishi
Also filed as: NISHI MINEO
12 granted patents·143 citations·filing 1981–2002
91Inventor score
Top patents by PatentIndex Score
12 records- 0179US5279918APhotoresist composition comprising a quinone diazide sulfonate of a novolac resinMITSUBISHI CHEM IND·Filed 1991·Granted Jan 18, 1994·35 cites·7 claims
- 0271US5514526AFluorine-containing composition for forming anti-reflection film on resist surface and pattern formation methodMITSUBISHI CHEM CORP·Filed 1993·Granted May 7, 1996·23 cites·23 claims
- 0361US5611850AComposition for anti-reflective coating on resistMITSUBISHI CHEM CORP·Filed 1996·Granted Mar 18, 1997·22 cites·7 claims
- 0460US5372909APhotosensitive resin composition comprising an alkali-soluble resin made from a phenolic compound and at least 2 different aldehydesMITSUBISHI CHEM IND·Filed 1992·Granted Dec 13, 1994·13 cites·23 claims
- 0557US5695906APhotosensitive resin composition and method for forming a pattern using the compositionMITSUBISHI CHEM CORP·Filed 1994·Granted Dec 9, 1997·16 cites·17 claims
- 0647US5447825AMethod for forming a pattern using a photosensitive composition comprising an alkali-soluble resin made from a phenolic compound and at least two different aldehydesMITSUBISHI CHEM CORP·Filed 1994·Granted Sep 5, 1995·7 cites·26 claims
- 0745US5759736APhotoresist compositionMITSUBISHI CHEM CORP·Filed 1997·Granted Jun 2, 1998·9 cites·9 claims
- 0844US5635329APhotosensitive resin composition and method for forming a pattern using the compositionMITSUBISHI CHEM CORP·Filed 1994·Granted Jun 3, 1997·7 cites·17 claims
- 0940US5698362A1,2 quinone diazide photosensitive resin composition containing select additive and method for forming a photoresist patternMITSUBISHI CHEM CORP·Filed 1997·Granted Dec 16, 1997·6 cites·15 claims
- 1039US6756453B2Alicylic epoxy compounds and their preparation process, alicylic epoxy resin composition, and encapsulant for light-emitting diodeMITSUBISHI CHEM CORP·Filed 2002·Granted Jun 29, 2004·0 cites·21 claims
- 1136US5660967APhotosensitive resin composition and method for forming photoresist pattern using the sameMITSUBISHI CHEM CORP·Filed 1995·Granted Aug 26, 1997·4 cites·10 claims
- 1226US4469882AProcess for the production of aromatic carbamatesMITSUBISHI CHEM IND·Filed 1981·Granted Sep 4, 1984·1 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →