Inventor · disambiguated record
Mihoko Ohashi
Also filed as: OHASHI MIHOKO
9 granted patents·5 pending applications·20 citations·filing 2001–2018
83Inventor score
Files withDAIKIN IND LTD13
Top patents by PatentIndex Score
14 records- 0182US7670640B2Curable fluorine-containing polymer, curable resin composition prepared from same and antireflection filmDAIKIN IND LTD·Filed 2005·Granted Mar 2, 2010·4 cites·15 claims
- 0272US7106940B2Fluorine-containing material for optical waveguideDAIKIN IND LTD·Filed 2005·Granted Sep 12, 2006·2 cites·24 claims
- 0371US10457625B2Treatment method of composition containing fluorine-containing organic acid having carbon number of 2 to 7 and impuritiesDAIKIN IND LTD·Filed 2016·Granted Oct 29, 2019·1 cites·20 claims
- 0465US6901205B2Fluorine-containing material for optical waveguideDAIKIN IND LTD·Filed 2003·Granted May 31, 2005·5 cites·28 claims
- 0553US7262252B2Nonlinear optical materials comprising fluorine-containing polymerDAIKIN IND LTD·Filed 2003·Granted Aug 28, 2007·4 cites·27 claims
- 0652US7842389B2Curable surface modifier and curable composition for surface modification prepared from sameDAIKIN IND LTD·Filed 2004·Granted Nov 30, 2010·2 cites·5 claims
- 0752US2010144993A1Curable fluorine-containing polymer, curable resin composition prepared from same and antireflection filmDAIKIN IND LTD·Filed 2010·Application pending·0 cites
- 0850US7211635B2Optical material containing curable fluorine-containing polymerDAIKIN IND LTD·Filed 2003·Granted May 1, 2007·2 cites·16 claims
- 0946US11266934B2Method and system for treating aqueous fluid resulting from fluoropolymer production stepDAIKIN IND LTD·Filed 2018·Granted Mar 8, 2022·0 cites·10 claims
- 1042US2004019176A1Curable fluoropolymer, curable resin composition containing the same, and antireflection filmFiled 2001·Application pending·0 cites
- 1140US2005265685A1Optical material containing photocurable fluoropolymer and photocurable fluororesin compositionDAIKIN IND LTD·Filed 2003·Application pending·0 cites
- 1239US2007196763A1Method of forming laminated resistDAIKIN IND LTD·Filed 2004·Application pending·0 cites
- 1338US2003073795A1Pellicle film for lithographyDAIKIN IND LTD·Filed 2002·Application pending·0 cites
- 1434US10759731B2Method for producing C2-C20 fluorine-containing organic acid, and composition comprising C2-C20 fluorine-containing organic acidDAIKIN IND LTD·Filed 2017·Granted Sep 1, 2020·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →