Inventor · disambiguated record
Mitsuhiro Ohkuni
Also filed as: OHKUNI MITSUHIRO
12 granted patents·3 pending applications·319 citations·filing 1993–2009
92Inventor score
Files withMATSUSHITA ELECTRIC INDUSTRIAL CO LTD9MATSUSHITA ELECTRONICS CORP2PANASONIC CORP2MATSUSHITA ELECTRIC COMPANY LT1OHKUNI MITSUHIRO1
Top patents by PatentIndex Score
15 records- 0197US5404079APlasma generating apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1993·Granted Apr 4, 1995·136 cites·8 claims
- 0277US5332880AMethod and apparatus for generating highly dense uniform plasma by use of a high frequency rotating electric fieldMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1993·Granted Jul 26, 1994·44 cites·19 claims
- 0375US6210593B1Etching method and etching apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1998·Granted Apr 3, 2001·35 cites·8 claims
- 0471US6187688B1Pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1997·Granted Feb 13, 2001·44 cites·13 claims
- 0566US5345145AMethod and apparatus for generating highly dense uniform plasma in a high frequency electric fieldMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1993·Granted Sep 6, 1994·33 cites·22 claims
- 0663US7494827B2Plasma etching method and plasma etching apparatusPANASONIC CORP·Filed 2006·Granted Feb 24, 2009·1 cites·26 claims
- 0754US2009159209A1Plasma etching method and plasma etching apparatusPANASONIC CORP·Filed 2009·Application pending·0 cites
- 0850US7268083B2Plasma etching apparatus and plasma etching processMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Sep 11, 2007·2 cites·12 claims
- 0950US2007074815A1Plasma ethching apparatus and plasma etching processMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2006·Application pending·0 cites
- 1046US6409877B1Apparatus and method for plasma etchingMATSUSHITA ELECTRONICS CORP·Filed 2001·Granted Jun 25, 2002·1 cites·8 claims
- 1146US5424905APlasma generating method and apparatusMATSUSHITA ELECTRIC COMPANY LT·Filed 1993·Granted Jun 13, 1995·9 cites·18 claims
- 1243US6274502B1Method for plasma etchingMATSUSHITA ELECTRONICS CORP·Filed 1998·Granted Aug 14, 2001·9 cites·7 claims
- 1342US2007004208A1Plasma etching apparatus and plasma etching methodOHKUNI MITSUHIRO·Filed 2006·Application pending·0 cites
- 1440US6582551B2Apparatus for plasma etching having rotating coil responsive to slide valve rotationMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Granted Jun 24, 2003·0 cites·2 claims
- 1536US6355183B1Apparatus and method for plasma etchingMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1999·Granted Mar 12, 2002·5 cites·2 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →