Inventor · disambiguated record
Miki Tamada
Also filed as: TAMADA Miki
7 granted patents·5 pending applications·2 citations·filing 2019–2025
69Inventor score
Files withJSR CORP12
Top patents by PatentIndex Score
12 records- 0191US11426761B2Modification method of surface of base, composition, and polymerJSR CORP·Filed 2020·Granted Aug 30, 2022·2 cites·18 claims
- 0274US2025321484A1Method for forming resist pattern and radiation-sensitive resin compositionJSR CORP·Filed 2025·Application pending·0 cites
- 0363US12372869B2Method for forming resist pattern and radiation-sensitive resin compositionJSR CORP·Filed 2021·Granted Jul 29, 2025·0 cites·17 claims
- 0458US11525067B2Modification method of substrate surface, and composition and polymerJSR CORP·Filed 2019·Granted Dec 13, 2022·0 cites·16 claims
- 0557US2023203229A1Composition, underlayer film, and directed self-assembly lithography processJSR CORP·Filed 2023·Application pending·0 cites
- 0657US2023259032A1Composition, underlayer film, and directed self-assembly lithography processJSR CORP·Filed 2023·Application pending·0 cites
- 0754US11603480B2Composition for underlayer film formation, underlayer film for directed self-assembled film and forming method thereof, and directed self-assembly lithography processJSR CORP·Filed 2019·Granted Mar 14, 2023·0 cites·20 claims
- 0851US11745216B2Method for producing filmJSR CORP·Filed 2022·Granted Sep 5, 2023·0 cites·20 claims
- 0944US11578230B2Composition, polymer, and method of producing substrateJSR CORP·Filed 2021·Granted Feb 14, 2023·0 cites·20 claims
- 1044US11462405B2Pattern-forming method and patterned substrateJSR CORP·Filed 2019·Granted Oct 4, 2022·0 cites·20 claims
- 1144US2020333707A1Resist pattern-forming method, and radiation-sensitive composition and production method thereofJSR CORP·Filed 2020·Application pending·0 cites
- 1242US2020013617A1Substrate treatment method, substrate treatment system and directed self-assembling materialJSR CORP·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →