Inventor · disambiguated record
Mitsutoyo Tanaka
Also filed as: TANAKA MITSUTOYO
5 granted patents·3 pending applications·24 citations·filing 2006–2010
76Inventor score
Files withSEIKO EPSON CORP8
Top patents by PatentIndex Score
8 records- 0182US7368078B2Metal powder production apparatusSEIKO EPSON CORP·Filed 2006·Granted May 6, 2008·9 cites·13 claims
- 0276US8025822B2Method of manufacturing a microlens substrate, an opposed substrate for a liquid crystal panel, a liquid crystal panel and a projection type display apparatusSEIKO EPSON CORP·Filed 2010·Granted Sep 27, 2011·5 cites·8 claims
- 0373US7553443B2Metal powder production apparatusSEIKO EPSON CORP·Filed 2006·Granted Jun 30, 2009·4 cites·13 claims
- 0472US7485254B2Metal powder production apparatusSEIKO EPSON CORP·Filed 2006·Granted Feb 3, 2009·4 cites·12 claims
- 0553US7554629B2Method of manufacturing a microlens substrate comprising pressure-joining a substrate to a base material in a state that the base material is heated while cooling the other major surface of the base materialSEIKO EPSON CORP·Filed 2006·Granted Jun 30, 2009·2 cites·6 claims
- 0644US2007138312A1Metal powder production apparatusSEIKO EPSON CORP·Filed 2006·Application pending·0 cites
- 0740US2006239174A1Method of manufacturing a microlens substrate, an opposed substrate for a liquid crystal panel, a liquid crystal panel and a projection type display apparatusSEIKO EPSON CORP·Filed 2006·Application pending·0 cites
- 0837US2007046863A1Microlens substrate, a liquid crystal panel and a projection type display apparatusSEIKO EPSON CORP·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →