Inventor · disambiguated record
Minoru Toriumi
Also filed as: TORIUMI MINORU
6 granted patents·5 pending applications·395 citations·filing 1987–2017
84Inventor score
Files withHITACHI LTD2SEMICONDUCTOR LEADING EDGE TEC2DAIKIN IND LTD1EVOLVING NANO PROCESS INFRASTRUCTURE DEV CENTER INC1HITACHI CHEMICAL CO LTD1
Top patents by PatentIndex Score
11 records- 0197US5512328AMethod for forming a pattern and forming a thin film used in pattern formationHITACHI LTD·Filed 1993·Granted Apr 30, 1996·336 cites·22 claims
- 0272US5621497APattern forming method and projection exposure tool thereforHITACHI LTD·Filed 1995·Granted Apr 15, 1997·33 cites·25 claims
- 0365US8163462B2Photosensitive composition, method for forming pattern, and method for manufacturing semiconductor deviceTORIUMI MINORU·Filed 2009·Granted Apr 24, 2012·3 cites·20 claims
- 0463US4792516APhotosensitive compositionHITACHI CHEMICAL CO LTD·Filed 1987·Granted Dec 20, 1988·17 cites·7 claims
- 0541US2005191578A1Process for preparing fluorine-containing polymer and photoresist compositionDAIKIN IND LTD·Filed 2005·Application pending·0 cites
- 0640US6803170B2Resist composition and method for manufacturing semiconductor device using the resist compositionSEMICONDUCTOR LEADING EDGE TEC·Filed 2001·Granted Oct 12, 2004·6 cites·21 claims
- 0736US10095108B2Photosensitive composition and pattern formation methodEVOLVING NANO PROCESS INFRASTRUCTURE DEV CENTER INC·Filed 2017·Granted Oct 9, 2018·0 cites·9 claims
- 0836US2004059033A1Composition for anti-reflective coating and method for manufacturing semiconductor deviceSEMICONDUCTOR LEADING EDGE TEC·Filed 2003·Application pending·0 cites
- 0935US2004234899A1Method of forming fine patternFiled 2002·Application pending·0 cites
- 1035US2004101787A1Fine pattern forming methodFiled 2002·Application pending·0 cites
- 1134US2004248042A1Method of forming fine patternFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →