Inventor · disambiguated record
Molela Moukara
Also filed as: MOUKARA MOLELA
11 granted patents·2 pending applications·126 citations·filing 2001–2010
90Inventor score
Technology areasG03F
Top patents by PatentIndex Score
13 records- 0184US6730463B2Method for determining and removing phase conflicts on alternating phase masksINFINEON TECHNOLOGIES AG·Filed 2002·Granted May 4, 2004·29 cites·5 claims
- 0284US6543045B2Method for detecting and automatically eliminating phase conflicts on alternating phase masksINFINEON TECHNOLOGIES AG·Filed 2001·Granted Apr 1, 2003·27 cites·6 claims
- 0383US7339652B2Apparatus for projecting a pattern into an image planeINFINEON TECHNOLOGIES AG·Filed 2006·Granted Mar 4, 2008·9 cites·22 claims
- 0480US6660437B2Alternating phase maskINFINEON TECHNOLOGIES AG·Filed 2002·Granted Dec 9, 2003·22 cites·16 claims
- 0572US6680151B2Alternating phase maskINFINEON TECHNOLOGIES AG·Filed 2002·Granted Jan 20, 2004·14 cites·7 claims
- 0670US6957414B2Method for determining the ability to project images of integrated semiconductor circuits onto alternating phase masksINFINEON TECHNOLOGIES AG·Filed 2003·Granted Oct 18, 2005·11 cites·14 claims
- 0768US8293431B2Lithographic mask and method of forming a lithographic maskROLFF HAIKO·Filed 2010·Granted Oct 23, 2012·3 cites·23 claims
- 0862US6981241B2Method for eliminating phase conflict centers in alternating phase masks, and method for producing alternating phase masksINFINEON TECHNOLOGIES AG·Filed 2003·Granted Dec 27, 2005·7 cites·18 claims
- 0955US7143390B2Method for creating alternating phase masksINFINEON TECHNOLOGIES AG·Filed 2004·Granted Nov 28, 2006·4 cites·25 claims
- 1036US7354683B2Lithography mask for imaging of convex structuresINFINEON TECHNOLOGIES AG·Filed 2004·Granted Apr 8, 2008·0 cites·30 claims
- 1134US7183022B2Method for producing a mask set for lithography including at least one mask and methods for imaging structures of a predetermined layout into a common exposure planeINFINEON TECHNOLGIES AG·Filed 2003·Granted Feb 27, 2007·0 cites·24 claims
- 1233US2006183258A1Imaging system and method for producing semiconductor structures on a wafer by imaging a mask on the wafer with a dipole diaphragmHENNIG MARIO·Filed 2006·Application pending·0 cites
- 1333US2006177773A1Method for producing semiconductor patterns on a waferHENNIG MARIO·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →