Inventor · disambiguated record
Motoki Nakashima
Also filed as: NAKASHIMA MOTOKI
51 granted patents·20 pending applications·164 citations·filing 2006–2025
98Inventor score
Top patents by PatentIndex Score
71 records- 0197US10079309B2Oxide material and semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2016·Granted Sep 18, 2018·5 cites·15 claims
- 0297US9954115B2Semiconductor device and method for manufacturing the sameSEMICONDUCTOR ENERGY LAB·Filed 2016·Granted Apr 24, 2018·12 cites·20 claims
- 0396US11843004B2Semiconductor device having specified relative material concentration between In—Ga—Zn—O filmsSEMICONDUCTOR ENERGY LAB·Filed 2021·Granted Dec 12, 2023·2 cites·18 claims
- 0496US9382611B2Sputtering target, method for manufacturing sputtering target, and method for forming thin filmYAMAZAKI SHUNPEI·Filed 2012·Granted Jul 5, 2016·17 cites·16 claims
- 0596US9368633B2Oxide material and semiconductor deviceYAMAZAKI SHUNPEI·Filed 2011·Granted Jun 14, 2016·8 cites·12 claims
- 0696US8889477B2Method for forming thin film utilizing sputtering targetYAMAZAKI SHUNPEI·Filed 2012·Granted Nov 18, 2014·16 cites·33 claims
- 0795US9653613B2Semiconductor device and manufacturing method thereofSEMICONDUCTOR ENERGY LAB·Filed 2016·Granted May 16, 2017·13 cites·23 claims
- 0894US11024725B2Semiconductor device including metal oxide filmSEMICONDUCTOR ENERGY LAB·Filed 2016·Granted Jun 1, 2021·8 cites·14 claims
- 0993US11658185B2Metal oxide and semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2021·Granted May 23, 2023·2 cites·16 claims
- 1093US10269979B2Semiconductor device and method for manufacturing the sameSEMICONDUCTOR ENERGY LAB·Filed 2018·Granted Apr 23, 2019·6 cites·19 claims
- 1193US9466728B2Semiconductor device and method for manufacturing the sameSEMICONDUCTOR ENERGY LAB·Filed 2015·Granted Oct 11, 2016·6 cites·22 claims
- 1292US9443987B2Semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2014·Granted Sep 13, 2016·10 cites·20 claims
- 1391US12396216B2Oxide material and semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2024·Granted Aug 19, 2025·0 cites·6 claims
- 1491US9437428B2Method of manufacturing a semiconductor device having an oxide semiconductor layer with increased hydrogen concentrationSEMICONDUCTOR ENERGY LAB·Filed 2014·Granted Sep 6, 2016·7 cites·14 claims
- 1591US9130048B2Method for manufacturing a thin film semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2012·Granted Sep 8, 2015·8 cites·14 claims
- 1691US2025015197A1Method for forming oxide semiconductor film, semiconductor device, and method for manufacturing semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2024·Application pending·0 cites
- 1789US12252775B2Sputtering target, method for manufacturing sputtering target, and method for forming thin filmSEMICONDUCTOR ENERGY LAB·Filed 2024·Granted Mar 18, 2025·0 cites·6 claims
- 1889US2025176270A1Semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2024·Application pending·0 cites
- 1988US10658517B2Semiconductor device and method for manufacturing the sameSEMICONDUCTOR ENERGY LAB·Filed 2019·Granted May 19, 2020·3 cites·14 claims
- 2088US9825181B2Transistor, circuit, semiconductor device, display device, and electronic deviceSEMICONDUCTOR ENERGY LAB·Filed 2016·Granted Nov 21, 2017·6 cites·24 claims
- 2188US8454748B2Method of calculating carrier mobilityIWAKI YUJI·Filed 2006·Granted Jun 4, 2013·19 cites·17 claims
- 2287US12218144B2Semiconductor device having specified relative material concentration between In—Ga—Zn—O filmsSEMICONDUCTOR ENERGY LAB·Filed 2023·Granted Feb 4, 2025·0 cites·18 claims
- 2387US12170339B2Method for forming oxide semiconductor film, semiconductor device, and method for manufacturing semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2023·Granted Dec 17, 2024·0 cites·24 claims
- 2487US12062724B2Method for forming oxide semiconductor film, semiconductor device, and method for manufacturing semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2023·Granted Aug 13, 2024·0 cites·10 claims
- 2587US2025287691A1Manufacturing method of semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2025·Application pending·0 cites
- 2686US12057510B2Oxide material and semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2023·Granted Aug 6, 2024·0 cites·12 claims
- 2786US11063066B2C-axis alignment of an oxide film over an oxide semiconductor filmSEMICONDUCTOR ENERGY LAB·Filed 2019·Granted Jul 13, 2021·2 cites·15 claims
- 2884US11967648B2Method for forming oxide semiconductor film, semiconductor device, and method for manufacturing semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2022·Granted Apr 23, 2024·0 cites·6 claims
- 2982US2024322018A1Semiconductor DeviceSEMICONDUCTOR ENERGY LAB·Filed 2024·Application pending·0 cites
- 3081US12446316B2Metal oxide and semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2023·Granted Oct 14, 2025·0 cites·20 claims
- 3181US12349460B2Manufacturing method of semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2022·Granted Jul 1, 2025·0 cites·8 claims
- 3280US11688810B2Oxide material and semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2021·Granted Jun 27, 2023·0 cites·10 claims
- 3380US11081326B2Sputtering target and method for manufacturing the sameSEMICONDUCTOR ENERGY LAB·Filed 2017·Granted Aug 3, 2021·2 cites·16 claims
- 3479US9816173B2Semiconductor device and manufacturing method thereofSEMICONDUCTOR ENERGY LAB·Filed 2012·Granted Nov 14, 2017·4 cites·17 claims
- 3579US2025146126A1Sputtering target, method for manufacturing sputtering target, and method for forming thin filmSEMICONDUCTOR ENERGY LAB·Filed 2025·Application pending·0 cites
- 3678US12002876B2Semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2022·Granted Jun 4, 2024·0 cites·13 claims
- 3778US11959165B2Semiconductor device comprising oxide semiconductor filmSEMICONDUCTOR ENERGY LAB·Filed 2021·Granted Apr 16, 2024·0 cites·6 claims
- 3878US10304859B2Semiconductor device having an oxide film on an oxide semiconductor filmSEMICONDUCTOR ENERGY LAB·Filed 2014·Granted May 28, 2019·2 cites·20 claims
- 3976US11489077B2Method for forming oxide semiconductor film, semiconductor device, and method for manufacturing semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2020·Granted Nov 1, 2022·0 cites·11 claims
- 4076US10889888B2Sputtering target, method for manufacturing sputtering target, and method for forming thin filmSEMICONDUCTOR ENERGY LAB·Filed 2016·Granted Jan 12, 2021·1 cites·10 claims
- 4175US11538928B2Semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2021·Granted Dec 27, 2022·0 cites·12 claims
- 4275US11217702B2Oxide material and semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2020·Granted Jan 4, 2022·0 cites·20 claims
- 4370US10950634B2Metal oxide and semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2020·Granted Mar 16, 2021·0 cites·8 claims
- 4469US11066739B2Sputtering target, method for manufacturing sputtering target, and method for forming thin filmSEMICONDUCTOR ENERGY LAB·Filed 2019·Granted Jul 20, 2021·0 cites·12 claims
- 4569US8604545B2Semiconductor device having single crystal silicon layer with local maximum of carbon concentration and shoulder peak of hydrogen concentrationSHIMOMURA AKIHISA·Filed 2011·Granted Dec 10, 2013·2 cites·12 claims
- 4667US11049977B2Oxide material and semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2018·Granted Jun 29, 2021·0 cites·24 claims
- 4767US9331206B2Oxide material and semiconductor deviceYAMAZAKI SHUNPEI·Filed 2012·Granted May 3, 2016·1 cites·6 claims
- 4867US2025200672A1Accounting systemSEMICONDUCTOR ENERGY LAB·Filed 2024·Application pending·0 cites
- 4966US2020035711A1Manufacturing method of semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2019·Application pending·0 cites
- 5065US11735403B2Sputtering target and method for manufacturing the sameSEMICONDUCTOR ENERGY LAB·Filed 2021·Granted Aug 22, 2023·0 cites·8 claims
Showing the top 50 of 71 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →