Inventor · disambiguated record
Motoyuki Yamada
Also filed as: YAMADA MOTOYUKI
21 granted patents·3 pending applications·289 citations·filing 1981–2015
95Inventor score
Top patents by PatentIndex Score
24 records- 0194US4358306AMethod for molding a fused quartz glass blockSHINETSU CHEMICAL CO·Filed 1981·Granted Nov 9, 1982·53 cites·8 claims
- 0291US7585598B2Titania-doped quartz glass and making method, EUV lithographic member and photomask substrateSHINETSU CHEMICAL CO·Filed 2006·Granted Sep 8, 2009·11 cites·13 claims
- 0390US9195130B2Pellicle for EUVSHINETSU CHEMICAL CO·Filed 2013·Granted Nov 24, 2015·6 cites·3 claims
- 0489US4849196AProcess for producing silicon carbide whiskersSHINETSU CHEMICAL CO·Filed 1987·Granted Jul 18, 1989·57 cites·13 claims
- 0585US4981666AMethod for the preparation of silicon carbide whiskersSHINETSU CHEMICAL CO·Filed 1986·Granted Jan 1, 1991·33 cites·6 claims
- 0681US9405184B2Pellicle for EUV, and an assembly including the pellicle, and a method for assembling the sameSHINETSU CHEMICAL CO·Filed 2015·Granted Aug 2, 2016·2 cites·7 claims
- 0774US6339940B1Synthetic quartz glass manufacturing processSHINETSU CHEMICAL CO·Filed 2000·Granted Jan 22, 2002·7 cites·10 claims
- 0872US6744458B2Internally marked quartz glass, quartz glass substrate for optical member, and marking methodSHINETSU CHEMICAL CO·Filed 2002·Granted Jun 1, 2004·11 cites·6 claims
- 0965US4432781AMethod for manufacturing fused quartz glassSHINETSU CHEMICAL CO·Filed 1982·Granted Feb 21, 1984·15 cites·3 claims
- 1063US6990836B2Method of producing fluorine-containing synthetic quartz glassSHINETSU CHEMICAL CO·Filed 2001·Granted Jan 31, 2006·6 cites·13 claims
- 1162US7849711B2Titania-doped quartz glass and making method, EUV lithographic member and photomask substrateSHINETSU CHEMICAL CO·Filed 2009·Granted Dec 14, 2010·0 cites·2 claims
- 1259US5618892A2,4-diamino-s-triazinyl group-containing polymer and negative radiation-sensitive resist composition containing the sameSHINETSU CHEMICAL CO·Filed 1995·Granted Apr 8, 1997·16 cites·2 claims
- 1358US4975392AMethod for manufacturing silicon carbide whiskerSHINETSU CHEMICAL CO·Filed 1989·Granted Dec 4, 1990·13 cites·18 claims
- 1455US9225010B2Silicon-containing particles, negative electrode material for nonaqueous electrolyte secondary battery using the same, nonaqueous electrolyte secondary battery, and method of manufacturing silicon-containing particlesSHINETSU CHEMICAL CO·Filed 2013·Granted Dec 29, 2015·0 cites·19 claims
- 1553US5314931AResist compositionsSHINETSU CHEMICAL CO·Filed 1992·Granted May 24, 1994·11 cites·9 claims
- 1652US2010202954A1Method for manufacturing of silicon, silicon, and solar cellSHINETSU CHEMICAL CO·Filed 2009·Application pending·0 cites
- 1751US5219681ALithium cellSHINETSU CHEMICAL CO·Filed 1991·Granted Jun 15, 1993·20 cites·8 claims
- 1849US5412050APolymer having a narrow dispersion of molecular weight and a manufacturing process thereofSHINETSU CHEMICAL CO·Filed 1993·Granted May 2, 1995·7 cites·18 claims
- 1947US5523370APoly(para-T-butoxycarbonyloxystyrene) and method of makingSHINETSU CHEMICAL CO·Filed 1995·Granted Jun 4, 1996·7 cites·8 claims
- 2047US5356753APositive resist materialSHINETSU CHEMICAL CO·Filed 1992·Granted Oct 18, 1994·8 cites·5 claims
- 2147US2010178195A1Method of solidifying metallic siliconYAMADA MOTOYUKI·Filed 2008·Application pending·0 cites
- 2245US2002046580A1Synthetic quartz glass article and process of productionSHINETSU CHEMICAL CO·Filed 2001·Application pending·0 cites
- 2341US5252691AP-vinylphenoxydimethylphenylcarbyldimethylsilane homopolymerSHINETSU CHEMICAL CO·Filed 1992·Granted Oct 12, 1993·5 cites·1 claims
- 2432US5668226A2,4-diamino-s-triazinyl group-containing polymer and negative radiation-sensitive resist composition containing the sameSHINETSU CHEMICAL CO·Filed 1996·Granted Sep 16, 1997·1 cites·3 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →