Inventor · disambiguated record
Mun-Jun Kim
Also filed as: KIM MUN S · KIM MUN-JUN
6 granted patents·9 pending applications·26 citations·filing 2004–2024
80Inventor score
Top patents by PatentIndex Score
15 records- 0192US10490623B2Semiconductor device including a plurality of electrodes and supportersSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Nov 26, 2019·6 cites·20 claims
- 0288US10879345B2Semiconductor device including a plurality of electrodes and supportersSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Dec 29, 2020·3 cites·20 claims
- 0388US9627469B2Oxide film, integrated circuit device, and methods of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Apr 18, 2017·7 cites·9 claims
- 0485US10170541B2Semiconductor device including a plurality of electrodes and supportersSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Jan 1, 2019·3 cites·20 claims
- 0578US7842569B2Flash memory device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Nov 30, 2010·7 cites·18 claims
- 0670US11626476B2Semiconductor device including a plurality of electrodes and supportersSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Apr 11, 2023·0 cites·20 claims
- 0766US2025227912A1Semiconductor memory deviceSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0861US2024196598A1Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 0958US2024178138A1Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1046US2010072569A1Method of forming an isolation layer, method of manufacturing a semiconductor device using the same, and semiconductor device having an isolation layerSAMSUNG ELECTRONICS CO LTD·Filed 2009·Application pending·0 cites
- 1142US2011037109A1Semiconductor devices including lower and upper device isolation patternsSAMSUNG ELECTRONICS CO LTD·Filed 2010·Application pending·0 cites
- 1241US2007020879A1Method of forming an isolation layer and method of manufacturing a field effect transistor using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 1339US2006032003A1Method for manufacturing three-dimensional fabric and three dimensional fabric using the sameKIM MUN S·Filed 2005·Application pending·0 cites
- 1439US2005224983A1Semiconductor structures and methods for forming patterns using nitrogen-free SiCOH anti-reflective layersKIM WON-JIN·Filed 2004·Application pending·0 cites
- 1538US2006105525A1Method for forming non-volatile memory deviceSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →