Inventor · disambiguated record
Naohiko Fujino
Also filed as: FUJINO NAOHIKO
17 granted patents·1 pending application·488 citations·filing 1993–2001
96Inventor score
Top patents by PatentIndex Score
18 records- 0188US6110291AThin film forming apparatus using laserMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Aug 29, 2000·67 cites·3 claims
- 0282US6355495B1Method and apparatus for analyzing minute foreign substance, and process for semiconductor elements or liquid crystal elements by use thereofMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Mar 12, 2002·27 cites·10 claims
- 0381US5650614AOptical scanning system utilizing an atomic force microscope and an optical microscopeMITSUBISHI ELECTRIC CORP·Filed 1995·Granted Jul 22, 1997·66 cites·5 claims
- 0480US5517027AMethod for detecting and examining slightly irregular surface states, scanning probe microscope therefor, and method for fabricating a semiconductor device or a liquid crystal display device using theseMITSUBISHI ELECTRIC CORP·Filed 1994·Granted May 14, 1996·55 cites·37 claims
- 0579US5715052AMethod of detecting the position and the content of fine foreign matter on substrates and analyzers used thereforMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Feb 3, 1998·58 cites·59 claims
- 0666US5877035AAnalyzing method and apparatus for minute foreign substances, and manufacturing methods for manufacturing semiconductor device and liquid crystal display device using the sameMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Mar 2, 1999·29 cites·33 claims
- 0766US5445171ASemiconductor cleaning apparatus and wafer cassetteMITSUBISHI ELECTRIC CORP·Filed 1993·Granted Aug 29, 1995·27 cites·3 claims
- 0865US6124142AMethod for analyzing minute foreign substance elementsSEIKO INSTR INC·Filed 1996·Granted Sep 26, 2000·27 cites·24 claims
- 0963US5568821ASemiconductor cleaning apparatus and wafer cassetteMITSUBISHI ELECTRIC CORP·Filed 1995·Granted Oct 29, 1996·21 cites·7 claims
- 1058US6255127B1Analyzing method and apparatus for minute foreign substances, and manufacturing methods for manufacturing semiconductor device and liquid crystal display device using the sameSEIKO INSTR INC·Filed 1998·Granted Jul 3, 2001·20 cites·10 claims
- 1158US6182675B1Apparatus for recovering impurities from a silicon waferMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Feb 6, 2001·26 cites·4 claims
- 1255US6259093B1Surface analyzing apparatusSEIKO INSTR INC·Filed 1998·Granted Jul 10, 2001·21 cites·17 claims
- 1354US6388249B2Surface analyzing apparatusSEIKO INSTR INC·Filed 2001·Granted May 14, 2002·3 cites·12 claims
- 1449US5907398AParticle detecting method and system for detecting minute particles on a workpieceMITSUBISHI ELECTRIC CORP·Filed 1997·Granted May 25, 1999·14 cites·20 claims
- 1548US5551459ASemiconductor cleaning apparatus and wafer cassetteMITSUBISHI ELECTRIC CORP·Filed 1995·Granted Sep 3, 1996·10 cites·19 claims
- 1647US5590672ASemiconductor cleaning apparatus and wafer cassetteMITSUBISHI ELECTRIC CORP·Filed 1995·Granted Jan 7, 1997·9 cites·14 claims
- 1740US6184519B1Surface analyzing apparatus with anti-vibration tableSEIKO INSTR INC·Filed 1998·Granted Feb 6, 2001·8 cites·35 claims
- 1825US2002026952A1Method of and device for cleaning silicon wafer, cleaned silicon wafer, and cleaned semiconductor elementFiled 1998·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →