Inventor · disambiguated record
Naoyuki Ishiwata
Also filed as: ISHIWATA NAOYUKI
6 granted patents·2 pending applications·34 citations·filing 1997–2011
77Inventor score
Top patents by PatentIndex Score
8 records- 0182US7279259B2Method for correcting pattern data and method for manufacturing semiconductor device using sameFUJITSU LTD·Filed 2005·Granted Oct 9, 2007·10 cites·16 claims
- 0265US7883823B2Photomask and method for manufacturing a semiconductor device using the photomaskFUJITSU SEMICONDUCTOR LTD·Filed 2008·Granted Feb 8, 2011·2 cites·8 claims
- 0362US7713664B2Method for fabricating an attenuated phase shift photomask by separate patterning of negative and positive resist layers with corresponding etching steps for underlying light-shielding and phase shift layers on a transparent substrateFUJITSU MICROELECTRONICS LTD·Filed 2006·Granted May 11, 2010·2 cites·15 claims
- 0457US6372392B1Transparent optical device and fabrication method thereofFUJITSU LTD·Filed 1997·Granted Apr 16, 2002·20 cites·32 claims
- 0543US2013256093A1LPG Fractionation Recovery SystemISHIWATA NAOYUKI·Filed 2011·Application pending·0 cites
- 0639US7803500B2Photomask, photomask fabrication method, and semiconductor device fabrication methodFUJITSU SEMICONDUCTOR LTD·Filed 2005·Granted Sep 28, 2010·0 cites·17 claims
- 0739US7678510B2Mask for exposure and method of manufacturing the sameFUJITSU MICROELECTRONICS LTD·Filed 2004·Granted Mar 16, 2010·0 cites·15 claims
- 0831US2006105249A1Exposure mask and method of manufacturing the sameFUJITSU LTD·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →