Inventor · disambiguated record
Natsuko Ito
Also filed as: ITO NATSUKO
16 granted patents·4 pending applications·765 citations·filing 1995–2008
95Inventor score
Top patents by PatentIndex Score
20 records- 0198US8051799B2Object-processing apparatus controlling production of particles in electric field or magnetic fieldRENESAS ELECTRONICS CORP·Filed 2007·Granted Nov 8, 2011·374 cites·20 claims
- 0294US6184489B1Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particlesNEC CORP·Filed 1999·Granted Feb 6, 2001·119 cites·13 claims
- 0387US6423176B1Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particlesNEC CORP·Filed 2000·Granted Jul 23, 2002·27 cites·27 claims
- 0484US6737666B1Apparatus and method for detecting an end point of a cleaning processNEC ELECTRONICS CORP·Filed 2000·Granted May 18, 2004·34 cites·8 claims
- 0580US5870189AParticle monitor and particle-free recessing system with particle monitorNEC CORP·Filed 1997·Granted Feb 9, 1999·63 cites·9 claims
- 0674US7974067B2Plasma processing apparatus and method of suppressing abnormal discharge thereinRENESAS ELECTRONICS CORP·Filed 2006·Granted Jul 5, 2011·5 cites·12 claims
- 0774US7006682B1Apparatus for monitoring particles and method of doing the sameNEC CORP·Filed 2000·Granted Feb 28, 2006·11 cites·81 claims
- 0872US7045465B2Particle-removing method for a semiconductor device manufacturing apparatusNEC ELECTRONICS CORP·Filed 2001·Granted May 16, 2006·10 cites·7 claims
- 0967US5861951AParticle monitoring instrumentNEC CORP·Filed 1997·Granted Jan 19, 1999·30 cites·3 claims
- 1066US6284049B1Processing apparatus for fabricating LSI devicesNEC CORP·Filed 2000·Granted Sep 4, 2001·9 cites·13 claims
- 1166US5747991ACapacitance type acceleration sensorNEC CORP·Filed 1995·Granted May 5, 1998·25 cites·9 claims
- 1262US6042650AProcessing apparatus for fabricating LSI with protected beam damperNEC CORP·Filed 1998·Granted Mar 28, 2000·23 cites·16 claims
- 1361US6346425B1Vapor-phase processing method capable of eliminating particle formationTOKYO ELECTRON LTD·Filed 2000·Granted Feb 12, 2002·8 cites·10 claims
- 1458US8202394B2Method of manufacturing semiconductor devices and semiconductor manufacturing apparatusMORIYA TSUYOSHI·Filed 2002·Granted Jun 19, 2012·6 cites·13 claims
- 1558US2008233756A1Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particlesITO NATSUKO·Filed 2008·Application pending·0 cites
- 1655US6115120ASystem and method for detecting particles produced in a process chamber by scattering lightNEC CORP·Filed 1999·Granted Sep 5, 2000·18 cites·13 claims
- 1753US2006131272A1Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particlesITO NATSUKO·Filed 2006·Application pending·0 cites
- 1836US2002036343A1Semiconductor fabrication device and method for preventing the attachment of extraneous particlesNEC CORP·Filed 2001·Application pending·0 cites
- 1936US2002037652A1Semiconductor device manufacturing apparatus and method for manufacturing a semiconductor deviceFiled 2001·Application pending·0 cites
- 2033US6306770B1Method and apparatus for plasma etchingNEC CORP·Filed 1999·Granted Oct 23, 2001·3 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →