Inventor · disambiguated record
Namkyun Kim
Also filed as: KIM NAMKYUN
5 granted patents·11 pending applications·0 citations·filing 2022–2025
59Inventor score
Files withSAMSUNG ELECTRONICS CO LTD16
Top patents by PatentIndex Score
16 records- 0166US12476089B2Plasma processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Nov 18, 2025·0 cites·19 claims
- 0266US2025146917A1Method of measuring parameters of plasma, apparatus for measuring parameters of plasma, plasma processing system, and method of processing waferSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 0362US12222362B2Method of measuring parameters of plasma, apparatus for measuring parameters of plasma, plasma processing system, and method of processing waferSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Feb 11, 2025·0 cites·17 claims
- 0460US12424412B2Apparatus for providing RF power and operating method thereofSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Sep 23, 2025·0 cites·13 claims
- 0560US11996275B2Device for radical diagnostic in plasma processing chamber, radical diagnostic system having the same, and operating method thereofSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted May 28, 2024·0 cites·18 claims
- 0658US2025218727A1Plasma generation circuit and substrate processing device including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0757US2025259827A1Plasma processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0855US2025226187A1Substrate processing apparatus for etching a substrate by using plasmaSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0954US12183555B2Substrate processing apparatus and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Dec 31, 2024·0 cites·20 claims
- 1054US2023402258A1Plasma processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1154US2023317418A1Substrate processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 1251US2024234094A9Plasma control device and plasma control methodSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1349US2023100582A1Substrate processing apparatus including plurality of electrodesSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 1448US2023207294A1Plasma control apparatus and plasma processing systemSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 1548US2024128054A1Plasma control apparatus and method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1642US2025391695A1Substrate treatment apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →