Inventor · disambiguated record
Natsuko Kinoshita
Also filed as: KINOSHITA NATSUKO
3 granted patents·12 pending applications·23 citations·filing 2009–2023
59Inventor score
Top patents by PatentIndex Score
15 records- 0185US8369777B2Communication apparatus, program, communication method and communication systemSONY CORP·Filed 2009·Granted Feb 5, 2013·23 cites·9 claims
- 0269US2023280652A1Radiation-sensitive resin composition, method for forming pattern, and method for producing monomeric compoundJSR CORP·Filed 2023·Application pending·0 cites
- 0364US2023384676A1Radiation-sensitive resin composition, method of forming pattern, polymer, and compoundJSR CORP·Filed 2023·Application pending·0 cites
- 0461US11709428B2Radiation-sensitive resin composition, method for forming pattern, and method for producing monomeric compoundJSR CORP·Filed 2021·Granted Jul 25, 2023·0 cites·9 claims
- 0561US2023400767A1Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compoundJSR CORP·Filed 2023·Application pending·0 cites
- 0656US2023236501A1Radiation-sensitive resin composition, method of forming resist pattern, and compoundJSR CORP·Filed 2023·Application pending·0 cites
- 0756US2025334881A1Radiation sensitive resin composition, pattern forming method, radiation sensitive acid generator, and acid diffusion control agentJSR CORP·Filed 2023·Application pending·0 cites
- 0854US2024385518A1Radiation-sensitive resin composition, resin, compound, and pattern formation methodJSR CORP·Filed 2022·Application pending·0 cites
- 0953US2022413385A1Radiation-sensitive resin composition and method of forming resist patternJSR CORP·Filed 2022·Application pending·0 cites
- 1051US2022283498A1Radiation-sensitive resin composition and method for forming resist patternJSR CORP·Filed 2022·Application pending·0 cites
- 1149US2021318613A9Radiation-sensitive resin composition and resist pattern-forming methodJSR CORP·Filed 2020·Application pending·0 cites
- 1248US2023104260A1Radiation-sensitive resin composition and method for forming resist patternJSR CORP·Filed 2021·Application pending·0 cites
- 1341US2020012194A1Radiation-sensitive resin composition, resist pattern-forming method and polymer compositionJSR CORP·Filed 2019·Application pending·0 cites
- 1440US11300877B2Radiation-sensitive resin composition, resist pattern-forming method and acid diffusion control agentJSR CORP·Filed 2018·Granted Apr 12, 2022·0 cites·20 claims
- 1536US2020102270A9Radiation-sensitive resin composition, resist pattern-forming method, and compoundJSR CORP·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →