Inventor · disambiguated record
Nana Okada
Also filed as: OKADA NANA
5 granted patents·6 pending applications·0 citations·filing 2017–2025
60Inventor score
Top patents by PatentIndex Score
11 records- 0172US11618762B2Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compoundADEKA CORP·Filed 2021·Granted Apr 4, 2023·0 cites·4 claims
- 0272US2024352044A1Metal alkoxide compound, thin film forming raw material, and thin film production methodADEKA CORP·Filed 2024·Application pending·0 cites
- 0365US2020140463A1Metal alkoxide compound, thin film forming raw material, and thin film production methodADEKA CORP·Filed 2018·Application pending·0 cites
- 0463US11555044B2Thin-film forming raw material for use in atomic layer deposition method, thin-film forming raw material, method for producing thin-film, and compoundADEKA CORP·Filed 2019·Granted Jan 17, 2023·0 cites·1 claims
- 0562US11161867B2Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compoundADEKA CORP·Filed 2017·Granted Nov 2, 2021·0 cites·4 claims
- 0658US2025305120A1Method for selective deposition of layer of interestSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 0755US12276022B2Alkoxide compound, thin-film forming raw material, and method of producing thin-filmADEKA CORP·Filed 2021·Granted Apr 15, 2025·0 cites·1 claims
- 0849US11760771B2Ruthenium compound, raw material for forming thin film, and method for producing thin filmADEKA CORP·Filed 2018·Granted Sep 19, 2023·0 cites·3 claims
- 0949US2020148706A1Metal alkoxide compound, thin-film-forming raw material and method of producing thin filmADEKA CORP·Filed 2018·Application pending·0 cites
- 1048US2025019820A1Thin-film forming material for use in atomic layer deposition, thin-film, method of producing thin-film, and ruthenium compoundADEKA CORP·Filed 2022·Application pending·0 cites
- 1139US2020131042A1Raw material for thin film formation, method for manufacturing thin film, and novel compoundADEKA CORP·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →