Inventor · disambiguated record
Naohiko Oyasato
Also filed as: OYASATO NAOHIKO
10 granted patents·382 citations·filing 1991–2007
92Inventor score
Files withTOSHIBA KK10
Top patents by PatentIndex Score
10 records- 0191US5403695AResist for forming patterns comprising an acid generating compound and a polymer having acid decomposable groupsTOSHIBA KK·Filed 1992·Granted Apr 4, 1995·83 cites·16 claims
- 0289US5658706AResist composition for forming a pattern comprising a pyridinium compound as an additiveTOSHIBA KK·Filed 1994·Granted Aug 19, 1997·82 cites·7 claims
- 0388US5326675APattern forming method including the formation of an acidic coating layer on the radiation-sensitive layerTOSHIBA KK·Filed 1992·Granted Jul 5, 1994·49 cites·18 claims
- 0481US5348835APhotosensitive resin composition for forming polyimide film pattern comprising an o-quinone diazide photosensitive agentTOSHIBA KK·Filed 1991·Granted Sep 20, 1994·33 cites·7 claims
- 0579US5518864AMethod of forming polyimide film patternTOSHIBA KK·Filed 1994·Granted May 21, 1996·31 cites·12 claims
- 0676US6332909B1Processing apparatus, processing system and processing methodTOSHIBA KK·Filed 1997·Granted Dec 25, 2001·40 cites·21 claims
- 0774US5744281AResist composition for forming a pattern and method of forming a pattern wherein the composition 4-phenylpyridine as an additiveTOSHIBA KK·Filed 1997·Granted Apr 28, 1998·34 cites·6 claims
- 0873US7340351B2Evaluation support apparatus and method for evaluation of recyclability/environmental loadTOSHIBA KK·Filed 2003·Granted Mar 4, 2008·6 cites·12 claims
- 0969US7877157B2Evaluation support apparatus and method for evaluation of recyclability/environmental loadTOSHIBA KK·Filed 2007·Granted Jan 25, 2011·1 cites·3 claims
- 1066USRE35821EPattern forming method including the formation of an acidic coating layer on the radiation-sensitive layerTOSHIBA KK·Filed 1996·Granted Jun 9, 1998·23 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →