Inventor · disambiguated record
Naresh Kumar Penta
Also filed as: PENTA NARESH K · PENTA NARESH KUMAR
15 granted patents·3 pending applications·44 citations·filing 2011–2019
88Inventor score
Files withROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC12ROHM & HAAS ELECT MAT3DANDU P R VEERA2PENTA NARESH K1
Top patents by PatentIndex Score
18 records- 0196US10119048B1Low-abrasive CMP slurry compositions with tunable selectivityROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Nov 6, 2018·24 cites·11 claims
- 0290US10626298B1Chemical mechanical polishing compositions and methods for suppressing the removal rate of amorphous siliconROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Granted Apr 21, 2020·5 cites·10 claims
- 0378US10787592B1Chemical mechanical polishing compositions and methods having enhanced defect inhibition and selectively polishing silicon nitride over silicon dioxide in an acid environmentROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Granted Sep 29, 2020·2 cites·8 claims
- 0475US8778203B2Tunable polish rates by varying dissolved oxygen contentDANDU P R VEERA·Filed 2011·Granted Jul 15, 2014·9 cites·6 claims
- 0569US9150759B2Chemical mechanical polishing composition for polishing silicon wafers and related methodsROHM & HAAS ELECT MAT·Filed 2013·Granted Oct 6, 2015·3 cites·8 claims
- 0663US8795548B1Silicon wafer polishing composition and related methodsROHM & HAAS ELECT MAT·Filed 2013·Granted Aug 5, 2014·1 cites·10 claims
- 0755US2020102478A1Chemical mechanical polishing composition and method of polishing silcon dioxide over silicon nitirideROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Application pending·0 cites
- 0853US10954411B2Chemical mechanical polishing composition and method of polishing silicon nitride over silicon dioxide and simultaneously inhibiting damage to silicon dioxideROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Granted Mar 23, 2021·0 cites·8 claims
- 0953US10584265B2Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using themROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Mar 10, 2020·0 cites·5 claims
- 1051US10508221B2Aqueous low abrasive silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of making and using themROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Dec 17, 2019·0 cites·8 claims
- 1146US11186748B2Aqueous anionic functional silica slurry and amine carboxylic acid compositions for selective nitride removal in polishing and methods of using themROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Nov 30, 2021·0 cites·7 claims
- 1246US10221336B2Aqueous silica slurry compositions for use in shallow trench isolation and methods of using themROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Mar 5, 2019·0 cites·10 claims
- 1345US10316218B2Aqueous silica slurry compositions for use in shallow trench isolation and methods of using themROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Jun 11, 2019·0 cites·6 claims
- 1445US8801959B1Stable, concentratable silicon wafer polishing composition and related methodsROHM & HAAS ELECT MAT·Filed 2013·Granted Aug 12, 2014·0 cites·10 claims
- 1544US10822524B2Aqueous compositions of low dishing silica particles for polysilicon polishingROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Nov 3, 2020·0 cites·10 claims
- 1644US10711158B2Aqueous silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of using themROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Jul 14, 2020·0 cites·7 claims
- 1739US2014299271A1Tunable Polish Rates By Varying Dissolved Oxygen ContentDANDU P R VEERA·Filed 2014·Application pending·0 cites
- 1838US2012190200A1Abrasive Free Silicon Chemical Mechanical PlanarizationPENTA NARESH K·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →