Inventor · disambiguated record
Naohiro Tango
Also filed as: TANGO NAOHIRO
15 granted patents·23 pending applications·18 citations·filing 2010–2025
85Inventor score
Top patents by PatentIndex Score
38 records- 0186US8841060B2Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic deviceKATAOKA SHOHEI·Filed 2012·Granted Sep 23, 2014·12 cites·20 claims
- 0280US2025370343A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2025·Application pending·0 cites
- 0377US11281103B2Composition for forming upper layer film, pattern forming method, resist pattern, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2017·Granted Mar 22, 2022·2 cites·13 claims
- 0472US10175578B2Pattern forming method, composition for forming protective film, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2017·Granted Jan 8, 2019·1 cites·15 claims
- 0567US2024201599A1Method for inspecting resist composition, method for producing resist composition, and resist compositionFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 0667US2024280362A1Method for testing photosensitive composition and method for producing photosensitive compositionFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 0766US2024248397A1Actinic ray-sensitive or radiation-sensitive resin composition and method for producing resist patternFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 0866US2024280915A1Method for testing photosensitive composition and method for producing photosensitive compositionFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 0966US2024231235A1Method for testing photosensitive composition and method for producing photosensitive compositionFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 1062US2023221644A1Method for producing composition for forming non-photosensitive upper layer film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 1160US2021271162A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2021·Application pending·0 cites
- 1259US2023045851A1Method for producing resist composition and pattern forming methodFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 1355US11579528B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2020·Granted Feb 14, 2023·0 cites·19 claims
- 1454US12235579B2Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2021·Granted Feb 25, 2025·0 cites·10 claims
- 1554US2021286263A1Active ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2021·Application pending·0 cites
- 1653US8846293B2Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same compositionIIZUKA YUSUKE·Filed 2012·Granted Sep 30, 2014·3 cites·13 claims
- 1752US12242192B2Photosensitive resin composition, method for producing the same, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2020·Granted Mar 4, 2025·0 cites·13 claims
- 1849US11584810B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method of manufacturing electronic device, compound, and resinFUJIFILM CORP·Filed 2019·Granted Feb 21, 2023·0 cites·16 claims
- 1949US2020183279A1Photosensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2020·Application pending·0 cites
- 2048US10852637B2Pattern forming method, resist pattern, method for manufacturing electronic device, and composition for forming upper layer filmFUJIFILM CORP·Filed 2017·Granted Dec 1, 2020·0 cites·12 claims
- 2146US2014212814A1Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom, method of forming pattern using the composition, process for manufacturing electronic device and electronic deviceFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 2246US2020183274A1Photosensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2020·Application pending·0 cites
- 2345US10578968B2Pattern forming method, resist pattern, and process for producing electronic deviceFUJIFILM CORP·Filed 2017·Granted Mar 3, 2020·0 cites·17 claims
- 2445US9454079B2Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming patternFUJIFILM CORP·Filed 2014·Granted Sep 27, 2016·0 cites·11 claims
- 2544US10114292B2Pattern forming method, resist pattern, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2017·Granted Oct 30, 2018·0 cites·18 claims
- 2644US2014234759A1Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming patternFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 2742US11249395B2Pattern forming method, method for manufacturing electronic device, laminate film, and composition for forming upper layer filmFUJIFILM CORP·Filed 2018·Granted Feb 15, 2022·0 cites·10 claims
- 2841US2019204736A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic deviceFUJIFILM CORP·Filed 2019·Application pending·0 cites
- 2941US2017349686A1Pattern forming method, resist pattern, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2017·Application pending·0 cites
- 3038US2018011406A1Pattern forming method, resist pattern, method for manufacturing electronic device, and composition for forming upper layer filmFUJIFILM CORP·Filed 2017·Application pending·0 cites
- 3138US2017351179A1Composition for forming upper layer film, pattern forming method using the same, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2017·Application pending·0 cites
- 3237US2017199460A1Pattern forming method, resist pattern, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2017·Application pending·0 cites
- 3337US2017184970A1Pattern forming method, composition for forming upper layer film, resist pattern, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2017·Application pending·0 cites
- 3435US9810981B2Pattern formation method, etching method, electronic device manufacturing method, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Nov 7, 2017·0 cites·13 claims
- 3534US2016026083A1Pattern forming method and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2015·Application pending·0 cites
- 3632US2012164573A1Actinic-ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the sameTANGO NAOHIRO·Filed 2011·Application pending·0 cites
- 3732US2012129100A1Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the sameSHIBUYA AKINORI·Filed 2010·Application pending·0 cites
- 3830US8846290B2Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the sameTANGO NAOHIRO·Filed 2010·Granted Sep 30, 2014·0 cites·29 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →