Inventor · disambiguated record
Natsumi Yokokawa
Also filed as: YOKOKAWA NATSUMI
22 granted patents·5 pending applications·53 citations·filing 2014–2024
92Inventor score
Files withFUJIFILM CORP27
Top patents by PatentIndex Score
27 records- 0195US9291896B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Mar 22, 2016·8 cites·20 claims
- 0293US10120281B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Nov 6, 2018·6 cites·20 claims
- 0393US9527809B2Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Dec 27, 2016·6 cites·12 claims
- 0491US9291898B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resinFUJIFILM CORP·Filed 2015·Granted Mar 22, 2016·8 cites·19 claims
- 0591US9188865B2Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2014·Granted Nov 17, 2015·7 cites·11 claims
- 0689US9798234B2Resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photo maskFUJIFILM CORP·Filed 2016·Granted Oct 24, 2017·4 cites·11 claims
- 0788US9291897B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Mar 22, 2016·3 cites·11 claims
- 0884US9651863B2Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Granted May 16, 2017·2 cites·22 claims
- 0980US9423690B2Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the sameFUJIFILM CORP·Filed 2015·Granted Aug 23, 2016·3 cites·14 claims
- 1080US2025091338A1On-machine development type planographic printing plate precursor, method for preparing planographic printing plate, and planographic printing methodFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 1176US9223215B2Actinic ray-sensitive or radiation-sensitive composition, actinic ray-sensitive or radiation-sensitive film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resinFUJIFILM CORP·Filed 2014·Granted Dec 29, 2015·2 cites·16 claims
- 1271US10945928B2Denture base coating composition, coating film-bearing denture base, plate denture, and method for producing coating film-bearing denture baseFUJIFILM CORP·Filed 2019·Granted Mar 16, 2021·1 cites·17 claims
- 1370US12187025B2On-machine development type planographic printing plate precursor, method for preparing planographic printing plate, and planographic printing methodFUJIFILM CORP·Filed 2021·Granted Jan 7, 2025·0 cites·30 claims
- 1470US9766547B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Sep 19, 2017·1 cites·11 claims
- 1568US10444627B2Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Oct 15, 2019·1 cites·19 claims
- 1665US9904168B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Feb 27, 2018·1 cites·10 claims
- 1758US12157296B2On-press development type lithographic printing plate precursor, method for preparing lithographic printing plate, and lithographic printing methodFUJIFILM CORP·Filed 2021·Granted Dec 3, 2024·0 cites·22 claims
- 1858US9500951B2Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Nov 22, 2016·0 cites·15 claims
- 1954US2021362529A1Lithographic printing plate precursor, method of preparing lithographic printing plate, and lithographic printing methodFUJIFILM CORP·Filed 2021·Application pending·0 cites
- 2051US11635701B2Planographic printing plate precursor, method of preparing planographic printing plate, and planographic printing methodFUJIFILM CORP·Filed 2021·Granted Apr 25, 2023·0 cites·16 claims
- 2148US2015086912A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method using the same, manufacturing method of semiconductor device, and semiconductor deviceFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 2247US2015118628A1Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom, method of forming pattern, process for manufacturing semiconductor device, and semiconductor deviceFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 2342US10526266B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, electronic device, compound, and method for producing compoundFUJIFILM CORP·Filed 2016·Granted Jan 7, 2020·0 cites·20 claims
- 2442US9551933B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Jan 24, 2017·0 cites·24 claims
- 2538US10324374B2Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, electronic device and novel compoundFUJIFILM CORP·Filed 2016·Granted Jun 18, 2019·0 cites·22 claims
- 2638US10011576B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compoundFUJIFILM CORP·Filed 2016·Granted Jul 3, 2018·0 cites·11 claims
- 2734US2015147688A1Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic deviceFUJIFILM CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →