Inventor · disambiguated record
No Young Chung
Also filed as: CHUNG NO Y · CHUNG NO YOUNG
11 granted patents·1 pending application·13 citations·filing 2005–2022
83Inventor score
Top patents by PatentIndex Score
12 records- 0184US10962874B2Methods of manufacturing semiconductor devices, method sof performing extreme ultraviolet ray exposure, and methods of performing optical proximity correctionSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Mar 30, 2021·2 cites·20 claims
- 0282US11557582B2Semiconductor device having improved marginsSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Jan 17, 2023·2 cites·19 claims
- 0382US10908498B2Optical proximity correction method and method of manufacturing mask by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Feb 2, 2021·2 cites·20 claims
- 0478US8555209B2Method for fabricating a semiconductor device using a modeling algorithm to model the proximity effect from the sub-layerCHUNG NO YOUNG·Filed 2011·Granted Oct 8, 2013·5 cites·26 claims
- 0570US10242921B2Method of forming pattern of semiconductor device from which various types of pattern defects are removedSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Mar 26, 2019·2 cites·19 claims
- 0668US12170278B2Semiconductor device and layout design methodSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Dec 17, 2024·0 cites·3 claims
- 0764US11935952B2Semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Mar 19, 2024·0 cites·20 claims
- 0851US11469325B2Semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Oct 11, 2022·0 cites·20 claims
- 0949US10852644B2Optical proximity correction method and method of fabricating lithography mask by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Dec 1, 2020·0 cites·20 claims
- 1042US11054736B2Extreme ultraviolet (EUV) mask for lithography and associated methodsSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Jul 6, 2021·0 cites·11 claims
- 1141US2005286037A1Semiconductor exposure apparatus and method for exposing semiconductor using the sameDONGBUANAM SEMICONDUCTOR INC·Filed 2005·Application pending·0 cites
- 1225US8786026B2Optimized channel implant for a semiconductor device and method of forming the sameJUNG MUKYENG·Filed 2011·Granted Jul 22, 2014·0 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →