Inventor · disambiguated record
Norio Hasegawa
Also filed as: HASEGAWA NORIO
118 granted patents·22 pending applications·2,395 citations·filing 1980–2024
99Inventor score
Top patents by PatentIndex Score
140 records- 0196US4869999AMethod of forming pattern and projection aligner for carrying out the sameHITACHI LTD·Filed 1987·Granted Sep 26, 1989·81 cites·9 claims
- 0296US4701900ADisc players fitted for automatic change of discsSONY CORP·Filed 1985·Granted Oct 20, 1987·77 cites·8 claims
- 0395US6483136B1Semiconductor integrated circuit and method of fabricating the sameHITACHI LTD·Filed 1998·Granted Nov 19, 2002·90 cites·31 claims
- 0495US4937619AProjection aligner and exposure methodHITACHI LTD·Filed 1989·Granted Jun 26, 1990·92 cites·20 claims
- 0594US5196910ASemiconductor memory device with recessed array regionHITACHI LTD·Filed 1991·Granted Mar 23, 1993·108 cites·21 claims
- 0693US6656644B2Manufacturing method of photomask and photomaskHITACHI LTD·Filed 2001·Granted Dec 2, 2003·64 cites·23 claims
- 0792US6278148B1Semiconductor device having a shielding conductorHITACHI LTD·Filed 1998·Granted Aug 21, 2001·139 cites·4 claims
- 0892US5328807AMethod of forming a patternHITICHI LTD·Filed 1991·Granted Jul 12, 1994·103 cites·16 claims
- 0992US4882289AMethod of making a semiconductor memory device with recessed array regionHITACHI LTD·Filed 1988·Granted Nov 21, 1989·85 cites·7 claims
- 1091US6649956B2Semiconductor integrated circuit device and manufacturing method thereofHITACHI LTD·Filed 2002·Granted Nov 18, 2003·38 cites·19 claims
- 1191US5235400AMethod of and apparatus for detecting defect on photomaskHITACHI LTD·Filed 1989·Granted Aug 10, 1993·77 cites·18 claims
- 1291US4904569AMethod of forming pattern and projection aligner for carrying out the sameHITACHI LTD·Filed 1988·Granted Feb 27, 1990·64 cites·5 claims
- 1390US7042038B2Semiconductor integrated circuit device and manufacturing method thereofHITACHI LTD·Filed 2003·Granted May 9, 2006·35 cites·8 claims
- 1490US6329112B1Method for measuring aberration of projection lens, method for forming patterns, mask, and method for correcting a projection lensHITACHI LTD·Filed 1999·Granted Dec 11, 2001·59 cites·13 claims
- 1588US8148682B2Method and apparatus for pattern position and overlay measurementHOTTA SHOJI·Filed 2009·Granted Apr 3, 2012·19 cites·20 claims
- 1688US5895741APhotomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design systemHITACHI LTD·Filed 1997·Granted Apr 20, 1999·59 cites·27 claims
- 1788US4992825AMethod of forming pattern and projection aligner for carrying out the sameHITACHI LTD·Filed 1989·Granted Feb 12, 1991·39 cites·13 claims
- 1888US4734814APlural disk cartridge arrangementSONY CORP·Filed 1986·Granted Mar 29, 1988·38 cites·5 claims
- 1987US5429896APhotomask and pattern forming method employing the sameHITACHI LTD·Filed 1993·Granted Jul 4, 1995·58 cites·20 claims
- 2087US5362591AMask having a phase shifter and method of manufacturing sameHITACHI LTD·Filed 1990·Granted Nov 8, 1994·42 cites·11 claims
- 2186US6548312B1Manufacturing method of semiconductor integrated circuit devices and mask manufacturing methodsHITACHI LTD·Filed 2000·Granted Apr 15, 2003·31 cites·31 claims
- 2285US6713231B1Method of manufacturing semiconductor integrated circuit devicesRENESAS TECH CORP·Filed 2000·Granted Mar 30, 2004·27 cites·27 claims
- 2382US6686107B2Method for producing a semiconductor deviceHITACHI LTD·Filed 2001·Granted Feb 3, 2004·18 cites·20 claims
- 2481US7252910B2Fabrication method of semiconductor integrated circuit device and mask fabrication methodDAINIPPON PRINTING CO LTD·Filed 2004·Granted Aug 7, 2007·19 cites·21 claims
- 2581US5700601APhotomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design systemHITACHI LTD·Filed 1995·Granted Dec 23, 1997·40 cites·22 claims
- 2680US6653052B2Electron device manufacturing method, a pattern forming method, and a photomask used for those methodsHITACHI LTD·Filed 2001·Granted Nov 25, 2003·15 cites·14 claims
- 2780US6403413B2Manufacturing method of semiconductor integrated circuit device having a capacitorHITACHI LTD·Filed 2001·Granted Jun 11, 2002·26 cites·19 claims
- 2880US4729965AMethod of forming extrinsic base by diffusion from polysilicon/silicide source and emitter by lithographyHITACHI LTD·Filed 1985·Granted Mar 8, 1988·39 cites·24 claims
- 2979US4575399AMethod of pattern detectionHITACHI LTD·Filed 1985·Granted Mar 11, 1986·40 cites·10 claims
- 3078US10302548B2Fluorescent particle measuring methodAZBIL CORP·Filed 2016·Granted May 28, 2019·1 cites·12 claims
- 3178US5296729ASemiconductor memory device having static random access memoryHITACHI LTD·Filed 1991·Granted Mar 22, 1994·48 cites·4 claims
- 3277US6686108B2Fabrication method of semiconductor integrated circuit deviceRENESAS TECH CORP·Filed 2001·Granted Feb 3, 2004·17 cites·27 claims
- 3377US6632744B2Manufacturing method of semiconductor integrated circuit deviceHITACHI LTD·Filed 2001·Granted Oct 14, 2003·17 cites·42 claims
- 3477US5323635AAir fuel ratio detecting arrangement and method therefor for an internal combustion engineHITACHI LTD·Filed 1993·Granted Jun 28, 1994·31 cites·12 claims
- 3577US4563241AMethod of forming patternsHITACHI LTD·Filed 1984·Granted Jan 7, 1986·26 cites·20 claims
- 3676US9024272B2Pattern measuring apparatusSAKAI KEI·Filed 2010·Granted May 5, 2015·6 cites·4 claims
- 3776US6677107B1Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used thereforHITACJI LTD·Filed 2000·Granted Jan 13, 2004·15 cites·3 claims
- 3875US9990708B2Pattern-measuring apparatus and semiconductor-measuring systemHITACHI HIGH TECH CORP·Filed 2014·Granted Jun 5, 2018·3 cites·5 claims
- 3975US8671366B2Estimating shape based on comparison between actual waveform and library in lithography processTANAKA MAKI·Filed 2010·Granted Mar 11, 2014·4 cites·4 claims
- 4074US6939649B2Fabrication method of semiconductor integrated circuit device and maskRENESAS TECH CORP·Filed 2002·Granted Sep 6, 2005·17 cites·48 claims
- 4174US6686099B2Method of manufacturing a photomaskRENESAS TECH CORP·Filed 2001·Granted Feb 3, 2004·12 cites·20 claims
- 4274US6645856B2Method for manufacturing a semiconductor device using half-tone phase-shift mask to transfer a pattern onto a substrateHITACHI LTD·Filed 2002·Granted Nov 11, 2003·16 cites·17 claims
- 4374US6617265B2Photomask and method for manufacturing the sameHITACHI LTD·Filed 2001·Granted Sep 9, 2003·16 cites·14 claims
- 4474US6558855B2Phase shift mask and manufacturing the sameHITACHI LTD·Filed 2001·Granted May 6, 2003·13 cites·9 claims
- 4574US6291847B1Semiconductor integrated circuit device and process for manufacturing the sameHITACHI LTD·Filed 1998·Granted Sep 18, 2001·30 cites·14 claims
- 4673US9297649B2Pattern dimension measurement method and charged particle beam apparatusKAWADA HIROKI·Filed 2011·Granted Mar 29, 2016·3 cites·7 claims
- 4772US7001712B2Manufacturing method of semiconductor integrated circuit deviceRENESAS TECH CORP·Filed 2003·Granted Feb 21, 2006·13 cites·11 claims
- 4872US6750000B2Electron device manufacturing method, a pattern forming method, and a photomask used for those methodsRENESAS TECH CORP·Filed 2003·Granted Jun 15, 2004·10 cites·6 claims
- 4971US10445875B2Pattern-measuring apparatus and semiconductor-measuring systemHITACHI HIGH TECH CORP·Filed 2018·Granted Oct 15, 2019·1 cites·7 claims
- 5071US6656646B2Fabrication method of semiconductor integrated circuit deviceHITACHI LTD·Filed 2002·Granted Dec 2, 2003·14 cites·18 claims
Showing the top 50 of 140 patent records by PatentIndex Score.
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