Inventor · disambiguated record
Nongmoon Hwang
Also filed as: HWANG NONGMOON
1 granted patent·1 pending application·1 citations·filing 2021–2023
15Inventor score
Files withSAMSUNG ELECTRONICS CO LTD2
Top patents by PatentIndex Score
2 records- 0174US11784026B2Substrate processing apparatus, material layer deposition apparatus, and atmospheric pressure chemical vapor deposition apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Oct 10, 2023·1 cites·18 claims
- 0255US2024011146A1Methods for forming coating films and substrate processing apparatus including parts manufactured by such methodsSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Nongmoon Hwang files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →