Inventor · disambiguated record
Noritaka Ishihara
Also filed as: ISHIHARA NORITAKA
48 granted patents·7 pending applications·395 citations·filing 2013–2025
98Inventor score
Top patents by PatentIndex Score
55 records- 0198US11652110B2Metal oxide film and method for forming metal oxide filmSEMICONDUCTOR ENERGY LAB·Filed 2021·Granted May 16, 2023·4 cites·16 claims
- 0298US10032928B2Semiconductor film, transistor, semiconductor device, display device, and electronic applianceSEMICONDUCTOR ENERGY LAB·Filed 2017·Granted Jul 24, 2018·16 cites·24 claims
- 0398US9559174B2Semiconductor film, transistor, semiconductor device, display device, and electronic applianceSEMICONDUCTOR ENERGY LAB·Filed 2016·Granted Jan 31, 2017·22 cites·21 claims
- 0498US9406760B2Semiconductor film, transistor, semiconductor device, display device, and electronic applianceSEMICONDUCTOR ENERGY LAB·Filed 2015·Granted Aug 2, 2016·24 cites·29 claims
- 0598US9123573B2Oxide semiconductor stacked film and semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2014·Granted Sep 1, 2015·79 cites·15 claims
- 0698US8890159B2Oxide semiconductor stacked film and semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2013·Granted Nov 18, 2014·61 cites·18 claims
- 0796US10892282B2Metal oxide film and method for forming metal oxide filmSEMICONDUCTOR ENERGY LAB·Filed 2018·Granted Jan 12, 2021·8 cites·40 claims
- 0896US9831274B2Metal oxide film and method for forming metal oxide filmSEMICONDUCTOR ENERGY LAB·Filed 2015·Granted Nov 28, 2017·10 cites·13 claims
- 0996US9806201B2Semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2015·Granted Oct 31, 2017·16 cites·15 claims
- 1095US9583570B2Oxide semiconductor stacked film and semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2015·Granted Feb 28, 2017·12 cites·25 claims
- 1195US8860023B2Semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2013·Granted Oct 14, 2014·15 cites·17 claims
- 1294US12154827B2Semiconductor device having plurality of insulatorsSEMICONDUCTOR ENERGY LAB·Filed 2023·Granted Nov 26, 2024·1 cites·2 claims
- 1394US10461099B2Metal oxide film and method for forming metal oxide filmSEMICONDUCTOR ENERGY LAB·Filed 2018·Granted Oct 29, 2019·5 cites·19 claims
- 1494US9947777B2Semiconductor device and method for manufacturing semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2017·Granted Apr 17, 2018·8 cites·24 claims
- 1594US9881939B2Metal oxide film and method for forming metal oxide filmSEMICONDUCTOR ENERGY LAB·Filed 2013·Granted Jan 30, 2018·10 cites·9 claims
- 1693US11152513B2Semiconductor device and method for manufacturing semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2018·Granted Oct 19, 2021·7 cites·20 claims
- 1793US9871058B2Metal oxide film and method for forming metal oxide filmSEMICONDUCTOR ENERGY LAB·Filed 2015·Granted Jan 16, 2018·6 cites·29 claims
- 1892US10038100B2Semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2017·Granted Jul 31, 2018·7 cites·23 claims
- 1991US11195758B2Semiconductor device and method for manufacturing semiconductor device having plurality of insulatorSEMICONDUCTOR ENERGY LAB·Filed 2018·Granted Dec 7, 2021·5 cites·12 claims
- 2091US9437428B2Method of manufacturing a semiconductor device having an oxide semiconductor layer with increased hydrogen concentrationSEMICONDUCTOR ENERGY LAB·Filed 2014·Granted Sep 6, 2016·7 cites·14 claims
- 2191US9281407B2Semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2015·Granted Mar 8, 2016·5 cites·12 claims
- 2290US12302639B2Metal oxide film and method for forming metal oxide filmSEMICONDUCTOR ENERGY LAB·Filed 2024·Granted May 13, 2025·0 cites·15 claims
- 2390US11637015B2Method for manufacturing sputtering target, method for forming oxide film, and transistorSEMICONDUCTOR ENERGY LAB·Filed 2021·Granted Apr 25, 2023·1 cites·14 claims
- 2490US10522347B2Method for manufacturing sputtering target, method for forming oxide film, and transistorSEMICONDUCTOR ENERGY LAB·Filed 2017·Granted Dec 31, 2019·4 cites·20 claims
- 2590US9595435B2Method for forming multilayer film including oxide semiconductor film and method for manufacturing semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2013·Granted Mar 14, 2017·10 cites·23 claims
- 2690US9425217B2Semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2014·Granted Aug 23, 2016·8 cites·20 claims
- 2790US9267199B2Method for manufacturing sputtering target, method for forming oxide film, and transistorSEMICONDUCTOR ENERGY LAB·Filed 2014·Granted Feb 23, 2016·6 cites·7 claims
- 2889US10741679B2Semiconductor device and method for manufactring semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2018·Granted Aug 11, 2020·4 cites·18 claims
- 2989US9496413B2Semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2016·Granted Nov 15, 2016·4 cites·12 claims
- 3088US11804407B2Semiconductor device having plurality of insulatorsSEMICONDUCTOR ENERGY LAB·Filed 2021·Granted Oct 31, 2023·1 cites·2 claims
- 3188US9825181B2Transistor, circuit, semiconductor device, display device, and electronic deviceSEMICONDUCTOR ENERGY LAB·Filed 2016·Granted Nov 21, 2017·6 cites·24 claims
- 3288US9035305B2Semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2014·Granted May 19, 2015·5 cites·16 claims
- 3387US9761734B2Semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2016·Granted Sep 12, 2017·4 cites·18 claims
- 3487US2025287691A1Manufacturing method of semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2025·Application pending·0 cites
- 3586US11978742B2Metal oxide film and method for forming metal oxide filmSEMICONDUCTOR ENERGY LAB·Filed 2023·Granted May 7, 2024·0 cites·28 claims
- 3685US11967505B2Method for manufacturing sputtering target, method for forming oxide film, and transistorSEMICONDUCTOR ENERGY LAB·Filed 2023·Granted Apr 23, 2024·0 cites·5 claims
- 3785US9911864B2Semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2017·Granted Mar 6, 2018·3 cites·13 claims
- 3885US9343578B2Semiconductor device and measurement deviceSEMICONDUCTOR ENERGY LAB·Filed 2013·Granted May 17, 2016·7 cites·47 claims
- 3981US12349460B2Manufacturing method of semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2022·Granted Jul 1, 2025·0 cites·8 claims
- 4081US11139166B2Method for manufacturing sputtering target, method for forming oxide film, and transistorSEMICONDUCTOR ENERGY LAB·Filed 2019·Granted Oct 5, 2021·1 cites·19 claims
- 4173US10439074B2Semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2018·Granted Oct 8, 2019·1 cites·20 claims
- 4270US10910388B2Semiconductor storage deviceTOSHIBA MEMORY CORP·Filed 2019·Granted Feb 2, 2021·1 cites·20 claims
- 4369US9761733B2Semiconductor device and method of manufacturing the sameSEMICONDUCTOR ENERGY LAB·Filed 2015·Granted Sep 12, 2017·1 cites·16 claims
- 4466US2020035711A1Manufacturing method of semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2019·Application pending·0 cites
- 4565US11742431B2Semiconductor device and method for manufacturing semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2021·Granted Aug 29, 2023·0 cites·14 claims
- 4660US2024365547A1Semiconductor storage device and method of manufacturing semiconductor storage deviceKIOXIA CORP·Filed 2024·Application pending·0 cites
- 4758US2016343733A1Manufacturing method of semiconductor deviceSEMICONDUCTOR ENERGY LAB·Filed 2016·Application pending·0 cites
- 4857US2016160342A1Method for manufacturing sputtering target, method for forming oxide film, and transistorSEMICONDUCTOR ENERGY LAB·Filed 2016·Application pending·0 cites
- 4954US11903202B2Method of manufacturing semiconductor deviceKIOXIA CORP·Filed 2021·Granted Feb 13, 2024·0 cites·20 claims
- 5053US10084096B2Semiconductor device and method of manufacturing the sameSEMICONDUCTOR ENERGY LAB·Filed 2017·Granted Sep 25, 2018·0 cites·14 claims
Showing the top 50 of 55 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →