Inventor · disambiguated record
Noriaki Kandaka
Also filed as: KANDAKA NORIAKI
13 granted patents·5 pending applications·491 citations·filing 1998–2016
93Inventor score
Top patents by PatentIndex Score
18 records- 0195US6504903B1Laser-excited plasma light source, exposure apparatus and its making method, and device manufacturing methodNIKON CORP·Filed 2000·Granted Jan 7, 2003·75 cites·29 claims
- 0293US6590959B2High-intensity sources of short-wavelength electromagnetic radiation for microlithography and other usesNIKON CORP·Filed 2001·Granted Jul 8, 2003·85 cites·28 claims
- 0389US6285743B1Method and apparatus for soft X-ray generationNIKON CORP·Filed 1999·Granted Sep 4, 2001·108 cites·33 claims
- 0484US7382527B2EUV multilayer mirror with phase shifting layerNIKON CORP·Filed 2006·Granted Jun 3, 2008·17 cites·20 claims
- 0583US6324255B1X-ray irradiation apparatus and x-ray exposure apparatusNIKON TECHNOLOGIES INC·Filed 1999·Granted Nov 27, 2001·70 cites·34 claims
- 0681US6898011B2Multi-layered film reflector manufacturing methodNIKON CORP·Filed 2002·Granted May 24, 2005·26 cites·19 claims
- 0777US6385290B1X-ray apparatusNIKON CORP·Filed 1999·Granted May 7, 2002·37 cites·17 claims
- 0876US6339634B1Soft x-ray light source deviceNIKON CORP·Filed 1999·Granted Jan 15, 2002·47 cites·31 claims
- 0970US7706058B2Multilayer mirror, method for manufacturing the same, and exposure equipmentNIKON CORP·Filed 2008·Granted Apr 27, 2010·4 cites·4 claims
- 1068US10353120B2Optical element, projection optical system, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2015·Granted Jul 16, 2019·1 cites·12 claims
- 1164US7440182B2Multilayer mirror, method for manufacturing the same, and exposure equipmentNIKON CORP·Filed 2007·Granted Oct 21, 2008·1 cites·6 claims
- 1254US6326617B1Photoelectron spectroscopy apparatusNAT INST OF ADV IND & TECHNOL·Filed 1998·Granted Dec 4, 2001·20 cites·19 claims
- 1352US10126660B2Multilayer film reflector, method of manufacturing multilayer film reflector, projection optical system, exposure apparatus, and method of manufacturing deviceNIKON CORP·Filed 2016·Granted Nov 13, 2018·0 cites·22 claims
- 1444US2005157384A1Multilayer reflective mirrors for EUV, wavefront-aberration-correction methods for same, and EUV optical systems comprising sameNIKON CORP·Filed 2004·Application pending·0 cites
- 1540US2003129325A1Film forming method,multilayer film reflector manufacturing method, and film forming deviceFiled 2002·Application pending·0 cites
- 1640US2002171922A1Multilayer reflective mirrors for EUV, wavefront-aberration-correction methods for same, and EUV optical systems comprising sameNIKON CORP·Filed 2001·Application pending·0 cites
- 1736US2003081722A1Multilayer-film mirrors for use in extreme UV optical systems, and methods for manufacturing such mirrors exhibiting improved wave aberrationsNIKON CORP·Filed 2002·Application pending·0 cites
- 1836US2004219728A1Extreme ultraviolet light generating device, exposure apparatus using the same and semiconductor manufacturing methodFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →