Inventor · disambiguated record
Norio Saitou
Also filed as: SAITOU NORIO
31 granted patents·4 pending applications·642 citations·filing 1981–2020
97Inventor score
Files withHITACHI LTD22PANASONIC IP MAN CO LTD3SOUKENBI CORP3PANASONIC I PRO SENSING SOLUTIONS CO LTD2CANON KK1
Top patents by PatentIndex Score
35 records- 0194US11450186B2Person monitoring system and person monitoring methodPANASONIC I PRO SENSING SOLUTIONS CO LTD·Filed 2020·Granted Sep 20, 2022·5 cites·9 claims
- 0292US6159644AMethod of fabricating semiconductor circuit devices utilizing multiple exposuresHITACHI LTD·Filed 1996·Granted Dec 12, 2000·100 cites·7 claims
- 0390US6667486B2Electron beam exposure method, electron beam exposure apparatus and device manufacturing method using the sameHITACHI LTD·Filed 2002·Granted Dec 23, 2003·34 cites·8 claims
- 0487US5420436AMethods for measuring optical system, and method and apparatus for exposure using said measuring methodHITACHI LTD·Filed 1993·Granted May 30, 1995·61 cites·14 claims
- 0585US4740698AHybrid charged particle apparatusHITACHI LTD·Filed 1987·Granted Apr 26, 1988·32 cites·6 claims
- 0683US6730916B1Electron beam lithography apparatusCANON KK·Filed 2000·Granted May 4, 2004·28 cites·43 claims
- 0783US4820928ALithography apparatusHITACHI LTD·Filed 1987·Granted Apr 11, 1989·33 cites·6 claims
- 0882US4443703AMethod and apparatus of deflection calibration for a charged particle beam exposure apparatusNIPPON TELEGRAPH & TELEPHONE·Filed 1982·Granted Apr 17, 1984·23 cites·8 claims
- 0981US7094867B2Method of continuously cleansing polyarylene sulfideKUREHA CORP·Filed 2002·Granted Aug 22, 2006·18 cites·12 claims
- 1079US5283440AElectron beam writing system used in a cell projection methodHITACHI LTD·Filed 1991·Granted Feb 1, 1994·34 cites·10 claims
- 1176US4692579AElectron beam lithography apparatusHITACHI LTD·Filed 1985·Granted Sep 8, 1987·21 cites·7 claims
- 1274US6946665B2Charged particle beam exposure method and apparatus and device manufacturing method using the apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted Sep 20, 2005·18 cites·9 claims
- 1373US5162240AMethod and apparatus of fabricating electric circuit pattern on thick and thin film hybrid multilayer wiring substrateHITACHI LTD·Filed 1990·Granted Nov 10, 1992·47 cites·37 claims
- 1471US6768118B2Electron beam monitoring sensor and electron beam monitoring methodHITACHI LTD·Filed 2003·Granted Jul 27, 2004·8 cites·11 claims
- 1570US4943729AElectron beam lithography systemHITACHI LTD·Filed 1988·Granted Jul 24, 1990·15 cites·5 claims
- 1669US5650631AElectron beam writing systemHITACHI LTD·Filed 1995·Granted Jul 22, 1997·22 cites·30 claims
- 1767US6511048B1Electron beam lithography apparatus and pattern forming methodHITACHI LTD·Filed 1998·Granted Jan 28, 2003·20 cites·15 claims
- 1865US4396901AMethod for correcting deflection distortion in an apparatus for charged particle lithographyHITACHI LTD·Filed 1981·Granted Aug 2, 1983·11 cites·11 claims
- 1963US5757409AExposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatusHITACHI LTD·Filed 1996·Granted May 26, 1998·25 cites·43 claims
- 2062US2014364760A1Skin Patch Instrument For Treating PainSOUKENBI CORP·Filed 2014·Application pending·0 cites
- 2162US2014316457A1Skin Patch Instrument For Treating PainSOUKENBI CORP·Filed 2014·Application pending·0 cites
- 2260US8827966B2Skin patch instrument for treating painSAITOU NORIO·Filed 2008·Granted Sep 9, 2014·0 cites·7 claims
- 2360US4701620AElectron beam exposure apparatusHITACHI LTD·Filed 1986·Granted Oct 20, 1987·10 cites·3 claims
- 2457US4829444ACharged particle beam lithography systemHITACHI LTD·Filed 1986·Granted May 9, 1989·9 cites·3 claims
- 2556US2017079867A1Skin Patch Instrument For Treating PainSOUKENBI CORP·Filed 2016·Application pending·0 cites
- 2653US5557314AExposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatusHITACHI LTD·Filed 1993·Granted Sep 17, 1996·20 cites·17 claims
- 2751US5311026ACharged particle beam lithography system and method thereforHITACHI LTD·Filed 1992·Granted May 10, 1994·9 cites·11 claims
- 2850US5759423AElectron beam writing method and apparatus for carrying out the sameHITACHI LTD·Filed 1995·Granted Jun 2, 1998·9 cites·48 claims
- 2950US4445040AShaping aperture for a charged particle forming systemHITACHI LTD·Filed 1983·Granted Apr 24, 1984·6 cites·13 claims
- 3045US10791395B2Flying object detection system and flying object detection methodPANASONIC I PRO SENSING SOLUTIONS CO LTD·Filed 2019·Granted Sep 29, 2020·0 cites·18 claims
- 3145US4577111AApparatus for electron beam lithographyHITACHI LTD·Filed 1983·Granted Mar 18, 1986·12 cites·6 claims
- 3244US10182280B2Sound processing apparatus, sound processing system and sound processing methodPANASONIC IP MAN CO LTD·Filed 2014·Granted Jan 15, 2019·0 cites·27 claims
- 3344US4489241AExposure method with electron beam exposure apparatusHITACHI LTD·Filed 1982·Granted Dec 18, 1984·12 cites·13 claims
- 3444US2015281832A1Sound processing apparatus, sound processing system and sound processing methodPANASONIC IP MAN CO LTD·Filed 2014·Application pending·0 cites
- 3533US10592731B2Facial recognition system, facial recognition server, and facial recognition methodPANASONIC IP MAN CO LTD·Filed 2016·Granted Mar 17, 2020·0 cites·7 claims
Join the waitlist — get patent alerts
Get an alert when Norio Saitou files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →