Inventor · disambiguated record
Nobuo Uotani
Also filed as: UOTANI NOBUO
15 granted patents·8 pending applications·337 citations·filing 1986–2006
94Inventor score
Top patents by PatentIndex Score
23 records- 0194US6299659B1Polishing material composition and polishing method for polishing LSI devicesSHOWA DENKO KK·Filed 2000·Granted Oct 9, 2001·66 cites·18 claims
- 0292US6498222B1Water resistance imparter, ink composition, reactive fluid, and method of ink-jet recording with two fluidsSEIKO EPSON CORP·Filed 2000·Granted Dec 24, 2002·46 cites·49 claims
- 0391US6811597B2Ink composition, recording medium, inkjet recording method, and recordingSEIKO EPSON CORP·Filed 2002·Granted Nov 2, 2004·29 cites·35 claims
- 0489US6676735B2Aqueous inkSEIKO EPSON CORP·Filed 2001·Granted Jan 13, 2004·31 cites·19 claims
- 0587US6989054B2Ink jet white ink and titanium dioxide slurry thereforSEIKO EPSON CORP·Filed 2002·Granted Jan 24, 2006·37 cites·10 claims
- 0687US6362348B1Additive for inkjet printing, recording solution, method for preventing discoloration and fading of image, and recording sheetSEIKO EPSON CORP·Filed 2000·Granted Mar 26, 2002·20 cites·4 claims
- 0780US5491203APolyorganosiloxane and process for producing the sameSHOWA DENKO KK·Filed 1994·Granted Feb 13, 1996·27 cites·26 claims
- 0879US6547843B2LSI device polishing composition and method for producing LSI deviceSHOWA DENKO KK·Filed 2001·Granted Apr 15, 2003·21 cites·9 claims
- 0977US6761759B2Ink composition, ink jet recording method and recorded matterSEIKO EPSON CORP·Filed 2002·Granted Jul 13, 2004·14 cites·34 claims
- 1077US6337301B1Photocatalytic metal oxide composition, thin film, and compositeSHOWA DENKO KK·Filed 2000·Granted Jan 8, 2002·17 cites·15 claims
- 1162US6844263B2LSI device polishing composition and method for producing LSI deviceSHOWA DENKO KK·Filed 2003·Granted Jan 18, 2005·7 cites·14 claims
- 1261US6952025B2Semiconductor light-emitting deviceSHOWA DENKO KK·Filed 2001·Granted Oct 4, 2005·12 cites·16 claims
- 1359US7018455B2Ink composition, recording medium, ink jet recording method, and printed matterSEIKO EPSON CORP·Filed 2002·Granted Mar 28, 2006·4 cites·27 claims
- 1447US2004085421A1Ink composition, recording medium, inkjet recording method and recordingSEIKO EPSON CORP·Filed 2003·Application pending·0 cites
- 1547US2004011249A1Ink composition, recording medium, inkjet recording method, and recordingSEIKO EPSON CORP·Filed 2003·Application pending·0 cites
- 1643US2009093118A1Polishing compositionSHOWA DENKO KK·Filed 2006·Application pending·0 cites
- 1740US2007082456A1Polishing composition and polishing methodUOTANI NOBUO·Filed 2004·Application pending·0 cites
- 1839US4954590APreparation of polymer having isoindole structuresSHOWA DENKO KK·Filed 1989·Granted Sep 4, 1990·3 cites·1 claims
- 1939US2007128872A1Polishing composition and polishing methodITOH YUJI·Filed 2004·Application pending·0 cites
- 2037US4833231APolymer having isoindole structureSHOWA DENKO KK·Filed 1986·Granted May 23, 1989·3 cites·4 claims
- 2134US2004265730A1Photosensitive composition and production processes for photosensitive film and printed wiring boardFiled 2002·Application pending·0 cites
- 2232US2003125418A1Particulate alumina, method for producing particulate alumina, and composition containing particulate aluminaSHOW A DENKO K K·Filed 2002·Application pending·0 cites
- 2330US2003007890A1Detection-membrane and optical sensor using the sameFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →