Inventor · disambiguated record
Paul D. Sonntag
Also filed as: SONNTAG PAUL · SONNTAG PAUL D · SONNTAG PAUL DAVID
11 granted patents·146 citations·filing 1997–2009
89Inventor score
Top patents by PatentIndex Score
11 records- 0193US6513796B2Wafer chuck having a removable insertIBM·Filed 2001·Granted Feb 4, 2003·76 cites·14 claims
- 0288US6528219B1Dynamic alignment scheme for a photolithography systemIBM·Filed 2000·Granted Mar 4, 2003·33 cites·28 claims
- 0355US7456966B2Alignment mark system and method to improve wafer alignment search rangeIBM·Filed 2004·Granted Nov 25, 2008·5 cites·11 claims
- 0454US7687210B2Space tolerance with stitchingIBM·Filed 2007·Granted Mar 30, 2010·4 cites·16 claims
- 0545US8634063B2Wafer with design printed outside active region and spaced by design tolerance of reticle blindFROEBEL ROBERT T·Filed 2009·Granted Jan 21, 2014·0 cites·8 claims
- 0645US7656505B2Apparatus to easily measure reticle blind positioning with an exposure apparatusIBM·Filed 2006·Granted Feb 2, 2010·0 cites·6 claims
- 0741US6344698B2More robust alignment mark designIBM·Filed 1999·Granted Feb 5, 2002·14 cites·9 claims
- 0840US7171319B2Method and apparatus to separate field and grid parameters on first level wafersIBM·Filed 2004·Granted Jan 30, 2007·0 cites·19 claims
- 0939US5943587AMethod for making offset alignment marksIBM·Filed 1997·Granted Aug 24, 1999·10 cites·9 claims
- 1036US7005221B2Method and apparatus to easily measure reticle blind positioning with an exposure apparatusIBM·Filed 2002·Granted Feb 28, 2006·0 cites·6 claims
- 1130US6259164B1Offset alignment marks method and apparatusIBM·Filed 1999·Granted Jul 10, 2001·4 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →