Inventor · disambiguated record
Pamela M. Visintin
Also filed as: VISINTIN PAMELA · VISINTIN PAMELA M
6 granted patents·9 pending applications·81 citations·filing 2003–2019
80Inventor score
Files withADVANCED TECH MATERIALS7SUN CHEMICAL CORP3VISINTIN PAMELA M3KORZENSKI MICHAEL B1UNIV NORTH CAROLINA1
Top patents by PatentIndex Score
15 records- 0196US7960328B2Composition and method for recycling semiconductor wafers having low-k dielectric materials thereonADVANCED TECH MATERIALS·Filed 2006·Granted Jun 14, 2011·53 cites·23 claims
- 0291US8114220B2Formulations for cleaning ion-implanted photoresist layers from microelectronic devicesVISINTIN PAMELA M·Filed 2006·Granted Feb 14, 2012·23 cites·15 claims
- 0379US8642526B2Composition and method for recycling semiconductor wafers having low-k dielectric materials thereonVISINTIN PAMELA M·Filed 2011·Granted Feb 4, 2014·4 cites·16 claims
- 0476US10544307B2Chlorinated copper phthalocyanine pigmentsSUN CHEMICAL CORP·Filed 2016·Granted Jan 28, 2020·1 cites·10 claims
- 0566US11059978B2Chlorinated copper phthalocyanine pigmentsSUN CHEMICAL CORP·Filed 2019·Granted Jul 13, 2021·0 cites·11 claims
- 0663US10711137B2Pigment compositions containing chlorinated copper phthalocyanine pigments in the gamma crystal formSUN CHEMICAL CORP·Filed 2019·Granted Jul 14, 2020·0 cites·11 claims
- 0752US2010056410A1Compositions and methods for the removal of photoresist for a wafer rework applicationADVANCED TECH MATERIALS·Filed 2007·Application pending·0 cites
- 0848US2012042898A1Compositions and method for the removal of photoresist for a wafer rework applicationVISINTIN PAMELA M·Filed 2011·Application pending·0 cites
- 0945US2008125342A1Formulations for cleaning memory device structuresADVANCED TECH MATERIALS·Filed 2007·Application pending·0 cites
- 1043US2009301996A1Formulations for removing cooper-containing post-etch residue from microelectronic devicesADVANCED TECH MATERIALS·Filed 2006·Application pending·0 cites
- 1143US2010163788A1Liquid cleaner for the removal of post-etch residuesADVANCED TECH MATERIALS·Filed 2007·Application pending·0 cites
- 1243US2008271991A1Apparatus and Method for Supercritical Fluid Removal or Deposition ProcessesADVANCED TECH MATERIALS·Filed 2006·Application pending·0 cites
- 1343US2009192065A1Dense fluid compositions for removal of hardened photoresist, post-etch residue and/or bottom anti-reflective coatingADVANCED TECH MATERIALS·Filed 2006·Application pending·0 cites
- 1439US2007251551A1Removal of high-dose ion-implanted photoresist using self-assembled monolayers in solvent systemsKORZENSKI MICHAEL B·Filed 2006·Application pending·0 cites
- 1535US2004175948A1Metal chelation in carbon dioxideUNIV NORTH CAROLINA·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →