Inventor · disambiguated record
Pei-Cheng Hsu
Also filed as: HSU PEI-CHENG
79 granted patents·44 pending applications·494 citations·filing 2012–2025
98Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD115YEJEN APPLIANCES SHENZHEN LTD3LEE HSIN-CHANG2TAIWAN SEMICONDUCTOR MFG2HSU PEI-CHENG1
Top patents by PatentIndex Score
123 records- 0198US8679707B2Method of fabricating a lithography maskLEE HSIN-CHANG·Filed 2012·Granted Mar 25, 2014·86 cites·20 claims
- 0297US12153339B2Network type pellicle membrane and method for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 26, 2024·4 cites·20 claims
- 0397US12013632B2Pellicle having vent holeTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 18, 2024·2 cites·20 claims
- 0497US8877409B2Reflective mask and method of making sameHSU PEI-CHENG·Filed 2012·Granted Nov 4, 2014·324 cites·20 claims
- 0596US11243461B2Reflective mask and fabricating method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Feb 8, 2022·5 cites·20 claims
- 0695US12181797B2Extreme ultraviolet mask with alloy based absorbersTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 31, 2024·2 cites·20 claims
- 0795US12050399B2Pellicle assembly and method of making sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 30, 2024·2 cites·20 claims
- 0895US11385538B2Cleaning method for photo masks and apparatus thereforTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jul 12, 2022·3 cites·20 claims
- 0995US11143952B2Pellicle removal methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Oct 12, 2021·5 cites·20 claims
- 1095US10001701B1Pellicle structures and methods of fabricating thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 19, 2018·7 cites·20 claims
- 1194US12085843B2Method of manufacturing EUV photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Sep 10, 2024·1 cites·20 claims
- 1292US9244341B2Photomask and method for forming the sameTAIWAN SEMICONDUCTOR MFG·Filed 2015·Granted Jan 26, 2016·4 cites·20 claims
- 1391US11714350B2Method of fabricating and servicing a photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 1, 2023·1 cites·20 claims
- 1491US11561464B2EUV masks to prevent carbon contaminationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jan 24, 2023·1 cites·20 claims
- 1591US9213232B2Reflective mask and method of making sameTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Dec 15, 2015·5 cites·20 claims
- 1690US11204545B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Dec 21, 2021·2 cites·20 claims
- 1790US2025370329A1Carbon-containing diffusion barrier layer for protection of cnt euv pellicleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1889US12346027B2Methods of making a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jul 1, 2025·0 cites·20 claims
- 1989US11815804B2EUV mask blank and method of making EUV mask blankTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 14, 2023·1 cites·20 claims
- 2089US11789356B2Method of manufacturing EUV photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Oct 17, 2023·1 cites·20 claims
- 2189US10670959B2Pellicle and method of using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jun 2, 2020·2 cites·17 claims
- 2288US12339579B2Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jun 24, 2025·0 cites·20 claims
- 2388US2025362584A1Lithography mask having high extinction coefficient absorber and related systems and methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2488US2025355360A1Optical assembly with coating and methods of useTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2588US2025362580A1Extreme ultraviolet mask with capping layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2688US2025362588A1Reticle containerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2787US11619875B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 4, 2023·1 cites·20 claims
- 2887US11360384B2Method of fabricating and servicing a photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 14, 2022·4 cites·20 claims
- 2987US11029593B2Lithography mask with a black border regions and method of fabricating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 8, 2021·2 cites·20 claims
- 3087US2025306450A1Optical assembly with coating and methods of useTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3186US12346019B2Reflective maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jul 1, 2025·0 cites·20 claims
- 3286US12259649B2Cleaning method for photo masks and apparatus thereforTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Mar 25, 2025·0 cites·20 claims
- 3386US11237477B2Reticle containerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Feb 1, 2022·3 cites·20 claims
- 3486US10866504B2Lithography mask with a black border region and method of fabricating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 15, 2020·2 cites·20 claims
- 3586US10036951B2Pellicle assembly and fabrication methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jul 31, 2018·3 cites·18 claims
- 3686US2024385506A1Euv photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 3786US2024103358A1System and structure including a pellicleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 3885US12044960B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jul 23, 2024·0 cites·20 claims
- 3985US12038684B2Reflective mask and fabricating method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jul 16, 2024·0 cites·20 claims
- 4085US11506971B2Pellicle and method of using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Nov 22, 2022·1 cites·19 claims
- 4185US9535317B2Treating a capping layer of a maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jan 3, 2017·4 cites·20 claims
- 4285US2024329517A1Pellicle having vent holeTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4385US2025362581A1Euv lithography mask blanks, euv masks and methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4485US2025298304A1Reflective mask and method of making semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4584US12346023B2Optical assembly with coating and methods of useTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jul 1, 2025·0 cites·20 claims
- 4684US12153337B2Extreme ultraviolet mask with tantalum base alloy absorberTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Nov 26, 2024·0 cites·20 claims
- 4784US12147154B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Nov 19, 2024·0 cites·20 claims
- 4884US11960201B2Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Apr 16, 2024·0 cites·20 claims
- 4984US11829062B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Nov 28, 2023·1 cites·20 claims
- 5084US11106126B2Method of manufacturing EUV photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 31, 2021·3 cites·20 claims
Showing the top 50 of 123 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →