Inventor · disambiguated record
Peter Nehmiz
Also filed as: NEHMIZ PETER
13 granted patents·379 citations·filing 1978–1985
94Inventor score
Files withIBM13
Top patents by PatentIndex Score
13 records- 0196US4426584AMethod of compensating the proximity effect in electron beam projection systemsIBM·Filed 1981·Granted Jan 17, 1984·70 cites·4 claims
- 0291US4169230AMethod of exposure by means of corpuscular beam shadow printingIBM·Filed 1978·Granted Sep 25, 1979·33 cites·2 claims
- 0386US4448865AShadow projection mask for ion implantation and ion beam lithographyIBM·Filed 1982·Granted May 15, 1984·63 cites·13 claims
- 0485US4504558AMethod of compensating the proximity effect in electron beam projection systemsIBM·Filed 1983·Granted Mar 12, 1985·26 cites·5 claims
- 0585US4417946AMethod of making mask for structuring surface areasIBM·Filed 1982·Granted Nov 29, 1983·34 cites·12 claims
- 0683US4591540AMethod of transferring a pattern into a radiation-sensitive layerIBM·Filed 1984·Granted May 27, 1986·39 cites·11 claims
- 0777US4513203AMask and system for mutually aligning objects in ray exposure systemsIBM·Filed 1984·Granted Apr 23, 1985·19 cites·23 claims
- 0874US4334156AMethod of shadow printing exposureIBM·Filed 1979·Granted Jun 8, 1982·14 cites·11 claims
- 0973US4554458AElectron beam projection lithographyIBM·Filed 1984·Granted Nov 19, 1985·16 cites·7 claims
- 1070US4370554AAlignment system for particle beam lithographyIBM·Filed 1980·Granted Jan 25, 1983·33 cites·18 claims
- 1168US4578587AError-corrected corpuscular beam lithographyIBM·Filed 1985·Granted Mar 25, 1986·15 cites·10 claims
- 1257US4342817AMask for structuring surface areas, and method of making itIBM·Filed 1980·Granted Aug 3, 1982·14 cites·13 claims
- 1332US4267259AExposure processIBM·Filed 1979·Granted May 12, 1981·3 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →