Inventor · disambiguated record
Pei-Yang Yan
Also filed as: YAN PEI · YAN PEI-YANG
36 granted patents·7 pending applications·778 citations·filing 1993–2025
98Inventor score
Top patents by PatentIndex Score
43 records- 0191US6818361B2PhotomaskingINTEL CORP·Filed 2003·Granted Nov 16, 2004·31 cites·14 claims
- 0291US6641959B2Absorberless phase-shifting mask for EUVINTEL CORP·Filed 2001·Granted Nov 4, 2003·38 cites·22 claims
- 0391US6197454B1Clean-enclosure window to protect photolithographic maskINTEL CORP·Filed 1998·Granted Mar 6, 2001·73 cites·34 claims
- 0491US5303002AMethod and apparatus for enhancing the focus latitude in lithographyINTEL CORP·Filed 1993·Granted Apr 12, 1994·73 cites·36 claims
- 0589US6610447B2Extreme ultraviolet mask with improved absorberINTEL CORP·Filed 2001·Granted Aug 26, 2003·31 cites·7 claims
- 0689US6479195B1Mask absorber for extreme ultraviolet lithographyINTEL CORP·Filed 2000·Granted Nov 12, 2002·86 cites·16 claims
- 0788US6720118B2Enhanced inspection of extreme ultraviolet maskINTEL CORP·Filed 2003·Granted Apr 13, 2004·29 cites·18 claims
- 0887US6280886B1Clean-enclosure window to protect photolithographic maskINTEL CORP·Filed 2000·Granted Aug 28, 2001·24 cites·20 claims
- 0986US5928817AMethod of protecting an EUV mask from damage and contaminationINTEL CORP·Filed 1997·Granted Jul 27, 1999·63 cites·10 claims
- 1085US6607862B2Damascene extreme ultraviolet lithography alternative phase shift photomask and method of makingINTEL CORP·Filed 2001·Granted Aug 19, 2003·27 cites·56 claims
- 1184US6583068B2Enhanced inspection of extreme ultraviolet maskINTEL CORP·Filed 2001·Granted Jun 24, 2003·23 cites·10 claims
- 1281US5958629AUsing thin films as etch stop in EUV mask fabrication processINTEL CORP·Filed 1997·Granted Sep 28, 1999·46 cites·18 claims
- 1380US7556894B2Mask with minimum reflectivity over absorber layerINTEL CORP·Filed 2006·Granted Jul 7, 2009·4 cites·9 claims
- 1480US6905801B2High performance EUV maskINTEL CORP·Filed 2002·Granted Jun 14, 2005·20 cites·27 claims
- 1577US6756163B2Re-usable extreme ultraviolet lithography multilayer mask blankINTEL CORP·Filed 2002·Granted Jun 29, 2004·17 cites·30 claims
- 1675US7300724B2Interference multilayer capping design for multilayer reflective mask blanksINTEL CORP·Filed 2004·Granted Nov 27, 2007·15 cites·30 claims
- 1775US5935737AMethod for eliminating final euv mask repairs in the reflector regionINTEL CORP·Filed 1997·Granted Aug 10, 1999·34 cites·19 claims
- 1874US6913706B2Double-metal EUV mask absorberINTEL CORP·Filed 2002·Granted Jul 5, 2005·13 cites·23 claims
- 1974US6908714B2Absorber layer for EUVINTEL CORP·Filed 2003·Granted Jun 21, 2005·17 cites·19 claims
- 2074US6818357B2Photolithographic mask fabricationINTEL CORP·Filed 2001·Granted Nov 16, 2004·12 cites·82 claims
- 2173US7118832B2Reflective mask with high inspection contrastINTEL CORP·Filed 2003·Granted Oct 10, 2006·15 cites·18 claims
- 2272US6756158B2Thermal generation of mask patternINTEL CORP·Filed 2001·Granted Jun 29, 2004·9 cites·12 claims
- 2372US6593041B2Damascene extreme ultraviolet lithography (EUVL) photomask and method of makingINTEL CORP·Filed 2001·Granted Jul 15, 2003·11 cites·35 claims
- 2469US6830851B2Photolithographic mask fabricationINTEL CORP·Filed 2002·Granted Dec 14, 2004·9 cites·36 claims
- 2566US7410733B2Dual-layer EUV mask absorber with trenches having opposing sidewalls that are straight and parallelINTEL CORP·Filed 2005·Granted Aug 12, 2008·2 cites·7 claims
- 2663US7534532B2Method to correct EUVL mask substrate non-flatnessINTEL CORP·Filed 2005·Granted May 19, 2009·1 cites·18 claims
- 2762US6562522B1PhotomaskingINTEL CORP·Filed 1999·Granted May 13, 2003·28 cites·9 claims
- 2859US6630273B2Method to fabricate extreme ultraviolet lithography masksINTEL CORP·Filed 2001·Granted Oct 7, 2003·5 cites·5 claims
- 2958US7078136B2Thermally-generated mask patternINTEL CORP·Filed 2003·Granted Jul 18, 2006·5 cites·14 claims
- 3058US2025341649A1Subsurface geological site frameworkSCHLUMBERGER TECHNOLOGY CORP·Filed 2025·Application pending·0 cites
- 3157US2024124950A1Method for heat treating a steel componentSKF AB·Filed 2023·Application pending·0 cites
- 3255US12404748B2Carbon sequestration and storage site selection and usageSCHLUMBERGER TECHNOLOGY CORP·Filed 2023·Granted Sep 2, 2025·0 cites·16 claims
- 3355US6355381B1Method to fabricate extreme ultraviolet lithography masksINTEL CORP·Filed 1998·Granted Mar 12, 2002·14 cites·18 claims
- 3451US2025376751A1Surface treated steel materialSKF AB·Filed 2025·Application pending·0 cites
- 3549US7759022B2Phase shift mask structure and fabrication processINTEL CORP·Filed 2006·Granted Jul 20, 2010·0 cites·30 claims
- 3649US2024243629A1Air duct assembly for rotor, associated rotor and electric machineABB SCHWEIZ AG·Filed 2021·Application pending·0 cites
- 3748US7083881B2PhotomaskingINTEL CORP·Filed 2004·Granted Aug 1, 2006·1 cites·8 claims
- 3848US6998202B2Multilayer reflective extreme ultraviolet lithography mask blanksINTEL CORP·Filed 2003·Granted Feb 14, 2006·1 cites·28 claims
- 3948US6998203B2Proximity correcting lithography mask blanksINTEL CORP·Filed 2003·Granted Feb 14, 2006·1 cites·12 claims
- 4046US2009075179A1Extreme ultraviolet (euv) mask protection against inspection laser damageULTANIR ERDEM·Filed 2007·Application pending·0 cites
- 4142US7452637B2Method and apparatus for clean photomask handlingINTEL CORP·Filed 2004·Granted Nov 18, 2008·0 cites·10 claims
- 4242US2007090084A1Reclaim method for extreme ultraviolet lithography mask blank and associated productsYAN PEI-YANG·Filed 2005·Application pending·0 cites
- 4341US2006222961A1Leaky absorber for extreme ultraviolet maskYAN PEI-YANG·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →