Inventor · disambiguated record
Ping-Hsun Lin
Also filed as: LIN PING-HSUN
21 granted patents·14 pending applications·19 citations·filing 2017–2025
92Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD35
Top patents by PatentIndex Score
35 records- 0197US11860532B2Photomask including fiducial mark and method of making a semiconductor device using the photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 2, 2024·2 cites·20 claims
- 0297US11422466B2Photomask including fiducial mark and method of making semiconductor device using the photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 23, 2022·3 cites·20 claims
- 0395US12181797B2Extreme ultraviolet mask with alloy based absorbersTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 31, 2024·2 cites·20 claims
- 0491US10295899B2Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted May 21, 2019·4 cites·20 claims
- 0590US11042084B2Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 22, 2021·3 cites·20 claims
- 0689US11815804B2EUV mask blank and method of making EUV mask blankTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 14, 2023·1 cites·20 claims
- 0788US2025362584A1Lithography mask having high extinction coefficient absorber and related systems and methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0888US2025362580A1Extreme ultraviolet mask with capping layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0987US12366797B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jul 22, 2025·0 cites·20 claims
- 1087US12339582B2Photomask including fiducial mark and method of making a photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jun 24, 2025·0 cites·20 claims
- 1187US2025306450A1Optical assembly with coating and methods of useTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1285US2025314956A1Reflective masks and methods of manufacturing semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1384US12346023B2Optical assembly with coating and methods of useTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jul 1, 2025·0 cites·20 claims
- 1484US11435660B2Photomask and method of fabricating a photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Sep 6, 2022·2 cites·20 claims
- 1584US2025298305A1Reflective mask and method of making semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1683US12265322B2EUV mask blank and method of making EUV mask blankTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Apr 1, 2025·0 cites·20 claims
- 1783US10871721B2Mask blank for lithography and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 22, 2020·1 cites·20 claims
- 1883US2025323050A1Methods and systems for improving plasma ignition stabilityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1982US2024385111A1Mask characterization methods and apparatusesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2081US12044959B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jul 23, 2024·0 cites·20 claims
- 2180US2025123552A1Lithography mask having high extinction coefficient absorber and related systems and methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2278US2024404834A1Methods and systems for improving plasma ignition stabilityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2376US12400864B2Methods and systems for improving plasma ignition stabilityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 26, 2025·0 cites·20 claims
- 2476US12346020B2Optical assembly with coating and methods of useTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 1, 2025·0 cites·20 claims
- 2576US11982936B2Photomask and method of fabricating a photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted May 14, 2024·0 cites·20 claims
- 2674US12001132B2Protection layer on low thermal expansion material (LTEM) substrate of extreme ultraviolet (EUV) maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 4, 2024·1 cites·23 claims
- 2772US11287754B2Mask blank for lithography and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Mar 29, 2022·0 cites·20 claims
- 2871US12353120B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 8, 2025·0 cites·20 claims
- 2971US2023161241A1Extreme ultraviolet mask with capping layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 3067US2022365414A1Protection layer on low thermal expansion material (ltem) substrate of extreme ultraviolet (euv) maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 3163US11592737B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Feb 28, 2023·0 cites·20 claims
- 3262US2024069431A1Method of manufacturing photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 3353US11119398B2EUV photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Sep 14, 2021·0 cites·20 claims
- 3452US2023402283A1Method for fabricating maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 3552US2021333717A1Extreme ultraviolet mask and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →