Inventor · disambiguated record

Po-Chung Cheng

Also filed as: CHENG PO-CHUNG

152 granted patents·10 pending applications·189 citations·filing 2009–2025

99Inventor score

Technology areasH05G G03F H10P G06T H10D

Files withTAIWAN SEMICONDUCTOR MFG CO LTD160 CHEN YU-CHIH1 PAN HUNG-TING1

Top patents by PatentIndex Score

162 records

0197US11470710B2EUV light source and apparatus for EUV lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Oct 11, 2022·3 cites·20 claims
0297US11086209B2EUV lithography mask with a porous reflective multilayer structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Aug 10, 2021·7 cites·20 claims
0397US11086237B2Extreme ultraviolet lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 10, 2021·4 cites·20 claims
0497US10656539B2Radiation source for lithography processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted May 19, 2020·7 cites·20 claims
0597US10429729B2EUV radiation modification methods and systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Oct 1, 2019·7 cites·20 claims
0697US10314154B1System and method for extreme ultraviolet source controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 4, 2019·13 cites·20 claims
0797US10274844B1Lithography apparatus and method for protecting a reticleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 30, 2019·13 cites·20 claims
0896US12124178B2Lithography system and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Oct 22, 2024·2 cites·20 claims
0996US12085585B2Particle image velocimetry of extreme ultraviolet lithography systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Sep 10, 2024·2 cites·20 claims
1096US11809075B2EUV lithography mask with a porous reflective multilayer structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 7, 2023·2 cites·20 claims
1196US11029324B2Particle image velocimetry of extreme ultraviolet lithography systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 8, 2021·7 cites·20 claims
1296US10524345B2Residual gain monitoring and reduction for EUV drive laserTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 31, 2019·9 cites·20 claims
1395US11984314B2Particle removal methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted May 14, 2024·3 cites·20 claims
1495US11680958B2Particle image velocimetry of extreme ultraviolet lithography systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 20, 2023·3 cites·6 claims
1595US11675280B2Lithography system and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 13, 2023·2 cites·20 claims
1695US11528798B2Replacement method for droplet generatorTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 13, 2022·2 cites·20 claims
1795US10928741B2Radiation source for lithography processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Feb 23, 2021·3 cites·20 claims
1894US12055865B2Extreme ultraviolet lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 6, 2024·2 cites·20 claims
1994US10875060B2Method and apparatus for removing debris from collectorTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 29, 2020·8 cites·20 claims
2093US11419203B2EUV radiation modification methods and systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 16, 2022·2 cites·20 claims
2193US11275318B2Radiation source for lithography processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 15, 2022·2 cites·20 claims
2293US10917959B2EUV radiation modification methods and systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Feb 9, 2021·3 cites·20 claims
2393US10747119B2Apparatus and method for monitoring reflectivity of the collector for extreme ultraviolet radiation sourceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 18, 2020·4 cites·20 claims
2491US11832372B2EUV light source and apparatus for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Nov 28, 2023·1 cites·20 claims
2591US10718718B2EUV vessel inspection method and related systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 21, 2020·4 cites·20 claims
2691US10512147B1Extreme ultraviolet radiation source and droplet catcher thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 17, 2019·4 cites·20 claims
2790US10880981B2Collector pellicleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 29, 2020·4 cites·20 claims
2890US10678138B2Extreme ultraviolet (EUV) radiation source and a method for generating extreme ultraviolet radiationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 9, 2020·4 cites·20 claims
2990US10670970B1Lithography system and method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 2, 2020·3 cites·20 claims
3089US11800626B2Shock wave visualization for extreme ultraviolet plasma optimizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 24, 2023·1 cites·20 claims
3189US10980100B2Residual gain monitoring and reduction for EUV drive laserTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 13, 2021·2 cites·20 claims
3289US10880980B2EUV light source and apparatus for EUV lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 29, 2020·2 cites·20 claims
3388US10162277B2Extreme ultraviolet lithography system with debris trapper on exhaust lineTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 25, 2018·5 cites·20 claims
3488US2024377720A1EUV Lithography Mask With A Porous Reflective Multilayer StructureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
3587US10534279B1Methods and apparatus for removing contamination from lithographic toolTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jan 14, 2020·2 cites·20 claims
3687US10429314B2EUV vessel inspection method and related systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Oct 1, 2019·3 cites·20 claims
3787US10366973B2Layout modification method for exposure manufacturing processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jul 30, 2019·2 cites·20 claims
3887US2025334606A1Particle image velocimetry of extreme ultraviolet lithography systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
3986US12436164B2Particle image velocimetry of extreme ultraviolet lithography systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Oct 7, 2025·0 cites·20 claims
4086US11452197B2Shock wave visualization for extreme ultraviolet plasma optimizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Sep 20, 2022·2 cites·20 claims
4186US10969690B2Extreme ultraviolet control system for adjusting droplet illumination parametersTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Apr 6, 2021·2 cites·20 claims
4286US10642158B2Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted May 5, 2020·2 cites·20 claims
4385US11982944B2Method of lithography process and transferring a reticleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted May 14, 2024·0 cites·20 claims
4485US11172566B2Droplet generator, EUV lithography device and method of generating a series of droplets using a droplet generatorTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Nov 9, 2021·2 cites·20 claims
4585US11062898B2Particle removal apparatus, particle removal system and particle removal methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jul 13, 2021·3 cites·20 claims
4684US11204556B2Apparatus and method for monitoring reflectivity of the collector for extreme ultraviolet radiation sourceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Dec 21, 2021·1 cites·20 claims
4784US10859928B2EUV light source and apparatus for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 8, 2020·2 cites·20 claims
4883US10955762B2Radiation source apparatus and method for decreasing debris in radiation source apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Mar 23, 2021·1 cites·20 claims
4983US10877378B2Vessel for extreme ultraviolet radiation sourceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 29, 2020·2 cites·20 claims
5083US10871713B2Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Dec 22, 2020·1 cites·20 claims

Showing the top 50 of 162 patent records by PatentIndex Score.

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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →