Inventor · disambiguated record
Po-Ming Shih
Also filed as: SHIH PO-MING
13 granted patents·6 pending applications·2 citations·filing 2018–2025
83Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD19
Top patents by PatentIndex Score
19 records- 0187US12443117B2Methods and apparatus for reducing hydrogen permeation from lithographic toolTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Oct 14, 2025·0 cites·20 claims
- 0287US11687012B2Reduce mask defect impact by contamination decomposeTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 27, 2023·1 cites·20 claims
- 0387US2025362623A1Photolithography apparatus and method of operating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0483US12287590B2Reduce mask defect impact by contamination decomposeTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Apr 29, 2025·0 cites·20 claims
- 0582US2025362622A1Photolithography apparatus and method of operating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 0681US12025922B2Methods and apparatus for reducing hydrogen permeation from lithographic toolTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jul 2, 2024·0 cites·20 claims
- 0781US2025372376A1Euv photomask and related methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0880US2025216804A1Reduce mask defect impact by contamination decomposeTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0975US11561482B2Methods and apparatus for reducing hydrogen permeation from lithographic toolTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jan 24, 2023·0 cites·20 claims
- 1074US10849214B2Method of operating semiconductor apparatus and semiconductor apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Nov 24, 2020·1 cites·20 claims
- 1174US2024385511A1Reticle enclosure for lithography systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1273US12476109B2EUV photomask and related methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Nov 18, 2025·0 cites·20 claims
- 1371US12411419B2Droplet splash control for extreme ultraviolet photolithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Sep 9, 2025·0 cites·20 claims
- 1465US11187997B2Photolithography apparatus and method for handling waferTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Nov 30, 2021·0 cites·20 claims
- 1564US11229111B2Method of operating semiconductor apparatus and semiconductor apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jan 18, 2022·0 cites·20 claims
- 1663US2025021005A1System and method for reducing extreme ultraviolet (euv) vessel tin depositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 1760US10768534B2Photolithography apparatus and method and method for handling waferTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Sep 8, 2020·0 cites·20 claims
- 1858US11940738B2Droplet splash control for extreme ultra violet photolithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Mar 26, 2024·0 cites·20 claims
- 1948US12482655B2EUV photomask and related methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Nov 25, 2025·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →