Inventor · disambiguated record
Preston Cray Smith
Also filed as: SMITH PRESTON · SMITH PRESTON CRAY
9 granted patents·98 citations·filing 1998–2022
87Inventor score
Top patents by PatentIndex Score
9 records- 0192US9839942B1System for and method of by-product removal from a metal substrateTEXAS NAMEPLATE COMPANY INC·Filed 2015·Granted Dec 12, 2017·15 cites·14 claims
- 0290US11370000B2System for and method of by-product removal from a metal substrateTEXAS NAMEPLATE COMPANY INC·Filed 2021·Granted Jun 28, 2022·2 cites·8 claims
- 0387US11059077B2System for and method of by-product removal from a metal substrateTEXAS NAMEPLATE COMPANY INC·Filed 2017·Granted Jul 13, 2021·4 cites·18 claims
- 0481US6507081B2In-situ silicon nitride and silicon based oxide deposition with graded interface for damascene applicationINTEL CORP·Filed 2001·Granted Jan 14, 2003·25 cites·21 claims
- 0576US11037039B2Method and system for securing a tracking device to a componentSPM FLOW CONTROL INC·Filed 2016·Granted Jun 15, 2021·2 cites·12 claims
- 0676US6255233B1In-situ silicon nitride and silicon based oxide deposition with graded interface for damascene applicationINTEL CORP·Filed 1998·Granted Jul 3, 2001·45 cites·10 claims
- 0775US11865589B2System for and method of by-product removal from a metal substrateTEXAS NAMEPLATE COMPANY INC·Filed 2022·Granted Jan 9, 2024·0 cites·20 claims
- 0857US10011134B2Chemical etched two dimensional matrix symbols and method and process for making sameTEXAS NAMEPLATE COMPANY INC·Filed 2013·Granted Jul 3, 2018·0 cites·10 claims
- 0956US6642141B2In-situ silicon nitride and silicon based oxide deposition with graded interface for damascene applicationINTEL CORP·Filed 2001·Granted Nov 4, 2003·5 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →