Inventor · disambiguated record
Qing Min Wang
Also filed as: WANG QING · WANG QING M · WANG QING MIN
14 granted patents·20 pending applications·354 citations·filing 1999–2023
93Inventor score
Files withROHM & HAAS ELECT MAT9BOC GROUP INC8MA CE8SHENGYI TECHNOLOGY CO LTD2AMS OSRAM ASIA PACIFIC PTE LTD1
Top patents by PatentIndex Score
34 records- 0195US6436171B1Oxygen-selective adsorbentsBOC GROUP INC·Filed 2000·Granted Aug 20, 2002·73 cites·21 claims
- 0290US6491740B1Metallo-organic polymers for gas separation and purificationBOC GROUP INC·Filed 2000·Granted Dec 10, 2002·65 cites·4 claims
- 0388US7547631B2Organometallic compoundsROHM & HAAS ELECT MAT·Filed 2006·Granted Jun 16, 2009·8 cites·12 claims
- 0488US7514119B2Method and apparatus for using solution based precursors for atomic layer depositionLINDE INC·Filed 2006·Granted Apr 7, 2009·16 cites·1 claims
- 0588US6350298B1Adsorbents and adsorptive separation processBOC GROUP INC·Filed 1999·Granted Feb 26, 2002·87 cites·16 claims
- 0686US8012536B2Method of forming metal-containing layer using organometallic compoundsROHM & HAAS ELECT MAT·Filed 2008·Granted Sep 6, 2011·10 cites·10 claims
- 0786US6440876B1Low-K dielectric constant CVD precursors formed of cyclic siloxanes having in-ring SI—O—C, and uses thereofBOC GROUP INC·Filed 2001·Granted Aug 27, 2002·37 cites·15 claims
- 0883US6649540B2Organosilane CVD precursors and their use for making organosilane polymer low-k dielectric filmBOC GROUP INC·Filed 2001·Granted Nov 18, 2003·30 cites·13 claims
- 0981US7531458B2Organometallic compoundsROHM AND HAAS ELECTRONICS MATE·Filed 2006·Granted May 12, 2009·4 cites·9 claims
- 1078US8343580B2Organometallic compoundsROHM & HAAS ELECT MAT·Filed 2010·Granted Jan 1, 2013·2 cites·14 claims
- 1174US12466937B2Resin composition and use thereofSHENGYI TECHNOLOGY CO LTD·Filed 2022·Granted Nov 11, 2025·0 cites·16 claims
- 1273US6572923B2Asymmetric organocyclosiloxanes and their use for making organosilicon polymer low-k dielectric filmBOC GROUP INC·Filed 2002·Granted Jun 3, 2003·16 cites·19 claims
- 1371US10894848B2Polyarylene resinsROHM & HAAS ELECT MAT·Filed 2017·Granted Jan 19, 2021·2 cites·10 claims
- 1461US6790364B2Process for stripping amine borane complex from an electroless plating solutionBOC GROUP INC·Filed 2002·Granted Sep 14, 2004·4 cites·11 claims
- 1561US2024317985A1Resin compositionROHM & HAAS ELECT MAT·Filed 2023·Application pending·0 cites
- 1661US2024317940A1Photoimagable dielectricsROHM & HAAS ELECT MAT·Filed 2023·Application pending·0 cites
- 1757US2011287184A1Precursor compositions and methodsSHENAI-KHATKHATE DEODATTA VINAYAK·Filed 2011·Application pending·0 cites
- 1855US2021198396A1Bismaleimide cross-linker for low loss dielectricROHM & HAAS ELECT MAT·Filed 2020·Application pending·0 cites
- 1954US2024230847A1Optical device and method of manufactureAMS OSRAM ASIA PACIFIC PTE LTD·Filed 2022·Application pending·0 cites
- 2050US2010055321A1Precursors for atomic layer depositionMA CE·Filed 2007·Application pending·0 cites
- 2150US2024084137A1Resin composition, resin adhesive film, and application thereofSHENGYI TECHNOLOGY CO LTD·Filed 2021·Application pending·0 cites
- 2250US2009305504A1Single precursors for atomic layer depositionMA CE·Filed 2007·Application pending·0 cites
- 2349US2024356300A1Semiconductor wafer fabricationAMS SENSORS ASIA PTE LTD·Filed 2022·Application pending·0 cites
- 2449US2009220374A1Method and apparatus for using solution precursors for atomic layer depositionMA CE·Filed 2009·Application pending·0 cites
- 2547US2010036144A1Methods for atomic layer depositionMA CE·Filed 2007·Application pending·0 cites
- 2645US2005250347A1Method and apparatus for maintaining by-product volatility in deposition processBAILEY CHRISTOPHER M·Filed 2004·Application pending·0 cites
- 2745US2012295038A1Method and apparatus for using solution based precursors for atomic layer depositionMA CE·Filed 2011·Application pending·0 cites
- 2845US2012294753A1Method and apparatus for using solution based precursors for atomic layer depositionMA CE·Filed 2011·Application pending·0 cites
- 2942US2008026576A1Organometallic compoundsROHM & HAAS ELECT MAT·Filed 2006·Application pending·0 cites
- 3040US2004187731A1Acid copper electroplating solutionsFiled 2004·Application pending·0 cites
- 3139US2010151261A1Methods and apparatus for the vaporization and delivery of solution precursors for atomic layer depositionMA CE·Filed 2007·Application pending·0 cites
- 3238US2007077778A1Method of forming low dielectric constant layerBOC GROUP INC·Filed 2005·Application pending·0 cites
- 3337US2018171069A1Polyarylene resinsROHM & HAAS ELECT MAT·Filed 2017·Application pending·0 cites
- 3435US2006071213A1Low temperature selective epitaxial growth of silicon germanium layersMA CE·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →