Inventor · disambiguated record
Rangarajan Jagannathan
Also filed as: JAGANNATHAN RANGARAJAN
27 granted patents·2 pending applications·758 citations·filing 1988–2018
97Inventor score
Top patents by PatentIndex Score
29 records- 0198US7859013B2Metal oxide field effect transistor with a sharp haloIBM·Filed 2007·Granted Dec 28, 2010·100 cites·17 claims
- 0298US7595010B2Method for producing a doped nitride film, doped oxide film and other doped filmsIBM·Filed 2007·Granted Sep 29, 2009·57 cites·1 claims
- 0398US7361611B2Doped nitride film, doped oxide film and other doped filmsIBM·Filed 2006·Granted Apr 22, 2008·55 cites·14 claims
- 0486US8084329B2Transistor devices and methods of makingARNOLD JOHN C·Filed 2010·Granted Dec 27, 2011·8 cites·13 claims
- 0583US7435652B1Integration schemes for fabricating polysilicon gate MOSFET and high-K dielectric metal gate MOSFETIBM·Filed 2007·Granted Oct 14, 2008·11 cites·20 claims
- 0681US5635253AMethod of replenishing electroless gold plating bathsIBM·Filed 1995·Granted Jun 3, 1997·56 cites·16 claims
- 0778US6200891B1Removal of dielectric oxidesIBM·Filed 1998·Granted Mar 13, 2001·54 cites·29 claims
- 0876US6033996AProcess for removing etching residues, etching mask and silicon nitride and/or silicon dioxideIBM·Filed 1997·Granted Mar 7, 2000·48 cites·23 claims
- 0976US5962384AMethod for cleaning semiconductor devicesIBM·Filed 1997·Granted Oct 5, 1999·40 cites·9 claims
- 1072US6114249AChemical mechanical polishing of multiple material substrates and slurry having improved selectivityIBM·Filed 1998·Granted Sep 5, 2000·42 cites·5 claims
- 1171US5780363AEtching composition and use thereofIBM·Filed 1997·Granted Jul 14, 1998·43 cites·19 claims
- 1268US7384835B2Metal oxide field effect transistor with a sharp halo and a method of forming the transistorIBM·Filed 2006·Granted Jun 10, 2008·3 cites·16 claims
- 1367US5965465AEtching of silicon nitrideIBM·Filed 1997·Granted Oct 12, 1999·28 cites·17 claims
- 1464US6066267AEtching of silicon nitrideIBM·Filed 1999·Granted May 23, 2000·24 cites·10 claims
- 1561US6254796B1Selective etching of silicateIBM·Filed 1998·Granted Jul 3, 2001·24 cites·20 claims
- 1661US6150282ASelective removal of etching residuesIBM·Filed 1997·Granted Nov 21, 2000·25 cites·40 claims
- 1760US6361402B1Method for planarizing photoresistIBM·Filed 1999·Granted Mar 26, 2002·26 cites·22 claims
- 1860US5102456ATetra aza ligand systems as complexing agents for electroless deposition of copperIBM·Filed 1990·Granted Apr 7, 1992·21 cites·13 claims
- 1959US6117796ARemoval of silicon oxideIBM·Filed 1998·Granted Sep 12, 2000·23 cites·17 claims
- 2056US6191085B1Method for cleaning semiconductor devicesIBM·Filed 1999·Granted Feb 20, 2001·17 cites·10 claims
- 2152US2006237846A1Doped nitride film, doped oxide film and other doped films and deposition rate improvement for rtcvd processesIBM·Filed 2006·Application pending·0 cites
- 2250US5304284AMethods for etching a less reactive material in the presence of a more reactive materialIBM·Filed 1991·Granted Apr 19, 1994·22 cites·22 claims
- 2348US8536630B2Transistor devices and methods of makingARNOLD JOHN C·Filed 2011·Granted Sep 17, 2013·0 cites·3 claims
- 2446US5935869AMethod of planarizing semiconductor wafersIBM·Filed 1997·Granted Aug 10, 1999·14 cites·8 claims
- 2545US4818286AElectroless copper plating bathIBM·Filed 1988·Granted Apr 4, 1989·11 cites·26 claims
- 2645US2005287747A1Doped nitride film, doped oxide film and other doped filmsIBM·Filed 2004·Application pending·0 cites
- 2744US10882842B2Pyridinium compounds, a synthesis method therefor, metal or metal alloy plating baths containing said pyridinium compounds and a method for use of said metal or metal alloy plating bathsATOTECH DEUTSCHLAND GMBH·Filed 2018·Granted Jan 5, 2021·0 cites·15 claims
- 2843US11199769B2Method and apparatus for neutral beam processing based on gas cluster ion beam technologyEXOGENESIS CORP·Filed 2018·Granted Dec 14, 2021·0 cites·15 claims
- 2936US5059243ATetra aza ligand systems as complexing agents for electroless deposition of copperIBM·Filed 1989·Granted Oct 22, 1991·6 cites·41 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →