Inventor · disambiguated record
Ran Namgung
Also filed as: NAMGUNG RAN
20 granted patents·17 pending applications·18 citations·filing 2009–2025
90Inventor score
Top patents by PatentIndex Score
37 records- 0194US11609494B2Semiconductor photoresist composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2020·Granted Mar 21, 2023·5 cites·10 claims
- 0280US12158699B2Semiconductor photoresist composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2021·Granted Dec 3, 2024·1 cites·13 claims
- 0379US11092890B2Semiconductor resist composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2019·Granted Aug 17, 2021·2 cites·17 claims
- 0476US10066057B2Organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Sep 4, 2018·2 cites·20 claims
- 0572US9329475B2Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display deviceCHEIL IND INC·Filed 2014·Granted May 3, 2016·1 cites·9 claims
- 0671US11092889B2Semiconductor resist composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2018·Granted Aug 17, 2021·1 cites·16 claims
- 0771US10340148B2Polymer, organic layer composition, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2016·Granted Jul 2, 2019·2 cites·18 claims
- 0869US9873815B2Polymer, organic layer composition, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2016·Granted Jan 23, 2018·2 cites·5 claims
- 0962US9593205B2Polymer, organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Mar 14, 2017·1 cites·17 claims
- 1061US11789362B2Semiconductor resist composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2021·Granted Oct 17, 2023·0 cites·10 claims
- 1161US11789361B2Semiconductor resist composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2021·Granted Oct 17, 2023·0 cites·10 claims
- 1261US2024427248A1Resist topcoat composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 1361US2023028244A1Resist topcoat composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 1460US9758612B2Polymer, organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Sep 12, 2017·1 cites·22 claims
- 1560US2024393692A1Resist topcoat composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 1660US2025284197A1Resist topcoat composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2025·Application pending·0 cites
- 1757US2023024422A1Resist topcoat composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 1856US2023103089A1Resist underlayer composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 1955US2025284196A1Resist topcoat compositions and methods of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 2054US2025216785A1Resist topcoat compositions, and methods of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 2154US2023183190A1Compound for organic optoelectronic element, composition for organic optoelectronic element, organic optoelectronic element, and display deviceSAMSUNG SDI CO LTD·Filed 2021·Application pending·0 cites
- 2253US2024337933A1Resist topcoat composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2023·Application pending·0 cites
- 2350US2015160553A1Positive Photosensitive Resin Composition, Photosensitive Resin Film, and Display Device Using the SameCHEIL IND INC·Filed 2014·Application pending·0 cites
- 2449US2015051269A1Drug Delivery Conjugate Capable of Controlled Release, and Use ThereofPOSTECH ACAD IND FOUND·Filed 2013·Application pending·0 cites
- 2549US2023032354A1Method for forming photoresist patternsSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 2648US2025076764A1Resist topcoat composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 2748US2023026579A1Method for forming photoresist patternsSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 2848US2025076765A1Resist topcoat composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 2947US12306534B2Semiconductor photoresist composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2021·Granted May 20, 2025·0 cites·14 claims
- 3047US9115057B2Conjugate of arm-type polyethyleneglycol with linear polyethyleneimine as gene carrier and synthesis thereofKIM WON JONG·Filed 2009·Granted Aug 25, 2015·0 cites·20 claims
- 3146US11073761B2Semiconductor resist composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2018·Granted Jul 27, 2021·0 cites·20 claims
- 3244US11415885B2Semiconductor photoresist composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2020·Granted Aug 16, 2022·0 cites·14 claims
- 3339US2020041901A1Semiconductor resist composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2018·Application pending·0 cites
- 3434US10364221B2Monomer, organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2016·Granted Jul 30, 2019·0 cites·11 claims
- 3534US9862668B2Monomer, polymer, organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Jan 9, 2018·0 cites·22 claims
- 3630US10323124B2Polymer, organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Jun 18, 2019·0 cites·15 claims
- 3730US8961935B2MRI contrast agent coated with carboxylated mannan and method for producing the sameYOON SEONG JUN·Filed 2011·Granted Feb 24, 2015·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →