Inventor · disambiguated record
Ralf Zedlitz
Also filed as: ZEDLITZ RALF
5 granted patents·1 pending application·257 citations·filing 2001–2003
80Inventor score
Top patents by PatentIndex Score
6 records- 0194US6479373B2Method of structuring layers with a polysilicon layer and an overlying metal or metal silicide layer using a three step etching process with fluorine, chlorine, bromine containing gasesINFINEON TECHNOLOGIES AG·Filed 2001·Granted Nov 12, 2002·237 cites·21 claims
- 0266US7022209B2PVD method and PVD apparatusINFINEON TECHNOLOGIES AG·Filed 2003·Granted Apr 4, 2006·10 cites·30 claims
- 0357US6693022B2CVD method of producing in situ-doped polysilicon layers and polysilicon layered structuresINFINEON TECHNOLOGIES AG·Filed 2002·Granted Feb 17, 2004·6 cites·17 claims
- 0443US6784553B2Semiconductor device with self-aligned contact and method for manufacturing the deviceINFINEON TECHNOLOGIES SC300·Filed 2002·Granted Aug 31, 2004·2 cites·6 claims
- 0542US6362098B1Plasma-enhanced chemical vapor deposition (CVD) method to fill a trench in a semiconductor substrateMOTOROLA INC·Filed 2001·Granted Mar 26, 2002·2 cites·12 claims
- 0627US2003082031A1Wafer handling device and method for testing wafersFiled 2001·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Ralf Zedlitz files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →