Inventor · disambiguated record
Reiko Hinogami
Also filed as: HINOGAMI REIKO
3 granted patents·4 pending applications·20 citations·filing 2000–2023
66Inventor score
Top patents by PatentIndex Score
7 records- 0168US6514647B1Photomask, resist pattern formation method, method of determining alignment accuracy and method of fabricating semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Feb 4, 2003·10 cites·6 claims
- 0268US2024178442A1Fluoride ion conductive material and fluoride shuttle batteryPANASONIC HOLDINGS CORP·Filed 2023·Application pending·0 cites
- 0367US2024234800A9Fluoride ion conductive polymeric solid electrolyte, solid electrolyte material including the same, fluoride shuttle battery, and method for producing the samePANASONIC HOLDINGS CORP·Filed 2023·Application pending·0 cites
- 0460US2024014402A1Fluoride ion secondary battery and production method for samePANASONIC HOLDINGS CORP·Filed 2021·Application pending·0 cites
- 0557US6562710B2Semiconductor device and method for fabricating the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2001·Granted May 13, 2003·9 cites·4 claims
- 0641US7337423B2Mask pattern generating method and mask pattern generating apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Feb 26, 2008·1 cites·3 claims
- 0738US2004243967A1Semiconductor design layout pattern formation method and graphic pattern formation unitMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Reiko Hinogami files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →