Inventor · disambiguated record
Reinhard Neumann
Also filed as: NEUMANN REINHARD
9 granted patents·3 pending applications·18 citations·filing 2002–2015
83Inventor score
Files withCORNELIUS THOMAS3GSI HELMHOLTZZENTRUM FUR SCHWERIONENFORSCHUNG GMBH3SCHWERIONENFORSCH GMBH3SCHWERIONEN FORSCHUNG MBH GES1
Top patents by PatentIndex Score
12 records- 0175US8877345B2Nanowires and method for the production there ofCORNELIUS THOMAS·Filed 2009·Granted Nov 4, 2014·3 cites·14 claims
- 0265US10227703B2Nanowires and method for the production thereofGSI HELMHOLTZZENTRUM FUR SCHWERIONENFORSCHUNG GMBH·Filed 2014·Granted Mar 12, 2019·0 cites·30 claims
- 0363US2014151236A1Nanowire Structural ElementGSI HELMHOLTZZENTRUM FUR SCHWERIONENFORSCHUNG GMBH·Filed 2014·Application pending·0 cites
- 0461US10301733B2Nanowire structural elementGSI HELMHOLTZZENTRUM FUR SCHWERIONENFORSCHUNG GMBH·Filed 2015·Granted May 28, 2019·0 cites·10 claims
- 0558US9222185B2Nanowire structural elementCORNELIUS THOMAS·Filed 2009·Granted Dec 29, 2015·0 cites·12 claims
- 0658US8685348B2Nanowire structural elementCORNELIUS THOMAS·Filed 2009·Granted Apr 1, 2014·0 cites·14 claims
- 0752US7713397B2Method for the production of a metal membrane filterSCHWERIONEN FORSCHUNG MBH GES·Filed 2007·Granted May 11, 2010·1 cites·16 claims
- 0852US6908552B2Method of producing nanostructures in membrances, and asymmetrical membraneSCHWERIONENFORSCH GMBH·Filed 2002·Granted Jun 21, 2005·7 cites·6 claims
- 0950US7708871B2Nanodevice for controlled charged particle flow and method for producing sameSCHWERIONENFORSCH GMBH·Filed 2003·Granted May 4, 2010·7 cites·25 claims
- 1038US6923651B2Sheet material having metal points and method for the production thereofSCHWERIONENFORSCH GMBH·Filed 2004·Granted Aug 2, 2005·0 cites·55 claims
- 1137US2003196905A1Metal membrane filter, and method and apparatus for the production thereofFiled 2002·Application pending·0 cites
- 1229US2004055875A1Nanodevice for charged particle flow and method for producing sameFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →