Inventor · disambiguated record
Richard C. Hawthorne
Also filed as: HAWTHORNE RICHARD C
16 granted patents·714 citations·filing 1993–2000
95Inventor score
Technology areasH10P
Top patents by PatentIndex Score
16 records- 0195US5783495AMethod of wafer cleaning, and system and cleaning solution regarding sameMICRON TECHNOLOGY INC·Filed 1996·Granted Jul 21, 1998·173 cites·39 claims
- 0292US6235145B1System for wafer cleaningMICRON TECHNOLOGY INC·Filed 1998·Granted May 22, 2001·110 cites·6 claims
- 0388US6207587B1Method for forming a dielectricMICRON TECHNOLOGY INC·Filed 1997·Granted Mar 27, 2001·78 cites·40 claims
- 0483US5990019ASelective etching of oxidesMICRON TECHNOLOGY INC·Filed 1997·Granted Nov 23, 1999·58 cites·31 claims
- 0581US5685951AMethods and etchants for etching oxides of silicon with low selectivity in a vapor phase systemMICRON TECHNOLOGY INC·Filed 1996·Granted Nov 11, 1997·53 cites·31 claims
- 0673US5716535AMethods and etchants for etching oxides of silicon with low selectivityMICRON TECHNOLOGY INC·Filed 1996·Granted Feb 10, 1998·33 cites·29 claims
- 0771US5749975AProcess for dry cleaning wafer surfaces using a surface diffusion layerMICRON TECHNOLOGY INC·Filed 1995·Granted May 12, 1998·40 cites·17 claims
- 0871US5264396AMethod for enhancing nitridation and oxidation growth by introducing pulsed NF3MICRON SEMICONDUCTOR INC·Filed 1993·Granted Nov 23, 1993·46 cites·28 claims
- 0969US5928969AMethod for controlled selective polysilicon etchingMICRON TECHNOLOGY INC·Filed 1996·Granted Jul 27, 1999·34 cites·28 claims
- 1063US6029680AMethod for in situ removal of particulate residues resulting from cleaning treatmentsMICRON TECHNOLOGY INC·Filed 1998·Granted Feb 29, 2000·23 cites·48 claims
- 1163US5785875APhotoresist removal process using heated solvent vaporMICRON TECHNOLOGY INC·Filed 1996·Granted Jul 28, 1998·29 cites·35 claims
- 1259US5770263AMethod for in situ removal of particulate residues resulting from hydrofluoric acid cleaning treatmentsMICRON TECHNOLOGY INC·Filed 1995·Granted Jun 23, 1998·20 cites·27 claims
- 1350US6432841B1Method for forming a dielectricMICRON TECHNOLOGY INC·Filed 2000·Granted Aug 13, 2002·2 cites·14 claims
- 1439US6399504B1Methods and etchants for etching oxides of silicon with low selectivityMICRON TECHNOLOGY INC·Filed 1999·Granted Jun 4, 2002·5 cites·19 claims
- 1537US6010949AMethod for removing silicon nitride in the fabrication of semiconductor devicesMICRON TECHNOLOGY INC·Filed 1996·Granted Jan 4, 2000·8 cites·37 claims
- 1633US6210489B1Methods and etchants for etching oxides of silicon with low selectivityMICRON TECHNOLOGY INC·Filed 1999·Granted Apr 3, 2001·2 cites·21 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →