Inventor · disambiguated record
Rik Jonckheere
Also filed as: JONCKHEERE RIK · JONCKHEERE RIK M E
6 granted patents·1 pending application·43 citations·filing 1993–2018
78Inventor score
Top patents by PatentIndex Score
7 records- 0181US10353284B2Lithographic reticle systemIMEC VZW·Filed 2018·Granted Jul 16, 2019·2 cites·20 claims
- 0277US7750319B2Method and system for measuring contamination of a lithographical elementIMEC·Filed 2007·Granted Jul 6, 2010·6 cites·24 claims
- 0373US5624773AResolution-enhancing optical phase structure for a projection illumination systemIMEC INTER UNI MICRO ELECTR·Filed 1993·Granted Apr 29, 1997·33 cites·16 claims
- 0460US8006202B2Systems and methods for UV lithographyIMEC·Filed 2008·Granted Aug 23, 2011·1 cites·25 claims
- 0559US9086638B2Detection of contamination in EUV systemsJONCKHEERE RIK·Filed 2011·Granted Jul 21, 2015·1 cites·19 claims
- 0651US2009103069A1Detection of contamination in euv systemsIMEC INTER UNI MICRO ELECTR·Filed 2008·Application pending·0 cites
- 0738US10359694B2Lithographic mask for EUV lithographyIMEC VZW·Filed 2017·Granted Jul 23, 2019·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →