Inventor · disambiguated record
Rodney A. Kendall
Also filed as: KENDALL RODNEY A · KENDALL RODNEY ARTHUR
28 granted patents·730 citations·filing 1990–2003
97Inventor score
Top patents by PatentIndex Score
28 records- 0196US6724001B1Electron beam lithography apparatus with self actuated vacuum bypass valveIBM·Filed 2003·Granted Apr 20, 2004·79 cites·17 claims
- 0290US5981962ADistributed direct write lithography system using multiple variable shaped electron beamsIBM·Filed 1998·Granted Nov 9, 1999·76 cites·38 claims
- 0390US5508518ALithography tool with vibration isolationIBM·Filed 1995·Granted Apr 16, 1996·58 cites·10 claims
- 0487US6175122B1Method for writing a pattern using multiple variable shaped electron beamsIBM·Filed 1998·Granted Jan 16, 2001·57 cites·12 claims
- 0580US5140242AServo guided stage systemIBM·Filed 1990·Granted Aug 18, 1992·71 cites·23 claims
- 0680US5059090ATwo-dimensional positioning apparatusIBM·Filed 1990·Granted Oct 22, 1991·53 cites·18 claims
- 0779US5585629AElectron beam nano-metrology systemIBM·Filed 1996·Granted Dec 17, 1996·36 cites·11 claims
- 0878US5532903AMembrane electrostatic chuckIBM·Filed 1995·Granted Jul 2, 1996·54 cites·6 claims
- 0977US6252339B1Removable bombardment filament-module for electron beam projection systemsNIKON CORP·Filed 1998·Granted Jun 26, 2001·30 cites·16 claims
- 1073US5962859AMultiple variable shaped electron beam system with lithographic structureIBM·Filed 1998·Granted Oct 5, 1999·28 cites·33 claims
- 1167US6153885AToroidal charged particle deflector with high mechanical stability and accuracyNIKON CORP·Filed 1999·Granted Nov 28, 2000·18 cites·25 claims
- 1267US6091187AHigh emittance electron source having high illumination uniformityIBM·Filed 1998·Granted Jul 18, 2000·19 cites·17 claims
- 1367US5434424ASpinning reticle scanning projection lithography exposure system and methodIBM·Filed 1994·Granted Jul 18, 1995·19 cites·9 claims
- 1463US6053241ACooling method and apparatus for charged particle lenses and deflectorsNIKON CORP·Filed 1998·Granted Apr 25, 2000·16 cites·20 claims
- 1562US6437347B1Target locking system for electron beam lithographyIBM·Filed 1999·Granted Aug 20, 2002·15 cites·21 claims
- 1662US6414313B1Multiple numerical aperture electron beam projection lithography systemNIKON CORP·Filed 1999·Granted Jul 2, 2002·15 cites·24 claims
- 1761US5052844ABall joint with dynamic preload adjustmentIBM·Filed 1990·Granted Oct 1, 1991·20 cites·6 claims
- 1857US6483117B1Symmetric blanking for high stability in electron beam exposure systemsNIKON CORP·Filed 1999·Granted Nov 19, 2002·13 cites·20 claims
- 1957US6028662AAdjustment of particle beam landing angleIBM·Filed 1999·Granted Feb 22, 2000·12 cites·10 claims
- 2051US6596999B2High performance source for electron beam projection lithographyNIKON CORP·Filed 2001·Granted Jul 22, 2003·1 cites·20 claims
- 2150US5742065AHeater for membrane mask in an electron-beam lithography systemIBM·Filed 1997·Granted Apr 21, 1998·15 cites·12 claims
- 2247US6818906B1Electron beam position reference systemIBM·Filed 2003·Granted Nov 16, 2004·1 cites·6 claims
- 2345US6908255B2Remote clamping mechanism via vacuum feedthroughIBM·Filed 2003·Granted Jun 21, 2005·1 cites·10 claims
- 2444US6353231B1Pinhole detector for electron intensity distributionNIKON CORP·Filed 1998·Granted Mar 5, 2002·14 cites·16 claims
- 2539US6639219B2Electron scatter in a thin membrane to eliminate detector saturationIBM·Filed 2001·Granted Oct 28, 2003·0 cites·8 claims
- 2635US6369396B1Calibration target for electron beamsIBM·Filed 1999·Granted Apr 9, 2002·2 cites·19 claims
- 2733US6246053B1Non-contact autofocus height detector for lithography systemsIBM·Filed 1999·Granted Jun 12, 2001·3 cites·7 claims
- 2827US6588090B1Fabrication method of high precision, thermally stable electromagnetic coil vanesNIKON CORP·Filed 1999·Granted Jul 8, 2003·4 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →