Inventor · disambiguated record
Rodney C. Langley
Also filed as: LANGLEY RODNEY · LANGLEY RODNEY C
12 granted patents·1 pending application·362 citations·filing 1991–2004
92Inventor score
Top patents by PatentIndex Score
13 records- 0192US5686762ASemiconductor device with improved bond padsMICRON TECHNOLOGY INC·Filed 1995·Granted Nov 11, 1997·131 cites·16 claims
- 0286US6838390B2Method and apparatus for plasma etching a waferMICRON TECHNOLOGY INC·Filed 2000·Granted Jan 4, 2005·32 cites·6 claims
- 0373US5376235AMethod to eliminate corrosion in conductive elementsMICRON SEMICONDUCTOR INC·Filed 1993·Granted Dec 27, 1994·52 cites·18 claims
- 0469US5789754ALeak detection method and apparatus for plasma processing equipmentMICRON TECHNOLOGY INC·Filed 1996·Granted Aug 4, 1998·32 cites·1 claims
- 0565US5221414AProcess and system for stabilizing layer deposition and etch rates while simultaneously maintaining cleanliness in a water processing reaction chamberMICRON TECHNOLOGY INC·Filed 1991·Granted Jun 22, 1993·39 cites·12 claims
- 0664US6424733B2Method and apparatus for inspecting wafersMICRON TECHNOLOGY INC·Filed 1998·Granted Jul 23, 2002·30 cites·23 claims
- 0759US6080272AMethod and apparatus for plasma etching a waferMICRON TECHNOLOGY INC·Filed 1998·Granted Jun 27, 2000·17 cites·14 claims
- 0855US5217926AMethod of passivating a semiconductor waferMICRON TECHNOLOGY INC·Filed 1992·Granted Jun 8, 1993·24 cites·4 claims
- 0951US6293789B1Semiconductor processing apparatusesMICRON TECHNOLOGY INC·Filed 2000·Granted Sep 25, 2001·2 cites·5 claims
- 1047US6380100B2Semiconductor processing apparatuses, and methods of forming antireflective coating materials over substratesMICRON TECHNOLOGY INC·Filed 2001·Granted Apr 30, 2002·1 cites·18 claims
- 1143US2005048781A1Method for plasma etching a waferFiled 2004·Application pending·0 cites
- 1232USRE40819ESemiconductor device with improved bond padsMICRON TECHNOLOGY INC·Filed 1999·Granted Jul 7, 2009·2 cites·17 claims
- 1330US6248671B1Semiconductor processing apparatuses, and methods of forming antireflective coating materials over substratesMICRON TECHNOLOGY INC·Filed 1998·Granted Jun 19, 2001·0 cites·18 claims
Join the waitlist — get patent alerts
Get an alert when Rodney C. Langley files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →