Inventor · disambiguated record
Ru-Gun Liu
Also filed as: LIU RU G · LIU RU-GUN
379 granted patents·31 pending applications·6,209 citations·filing 2001–2025
99Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD291TAIWAN SEMICONDUCTOR MFG74WANG HUNG-CHUN7CHENG YING CHOU5CHEN HUANG-YU3
Top patents by PatentIndex Score
410 records- 0199US9576814B2Method of spacer patterning to form a target integrated circuit patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Feb 21, 2017·3.1k cites·20 claims
- 0299US9153478B2Spacer etching process for integrated circuit designTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Oct 6, 2015·118 cites·20 claims
- 0398US11862623B2Semiconductor device including source/drain contact having height below gate stackTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jan 2, 2024·3 cites·20 claims
- 0498US11342193B2Method of manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 24, 2022·4 cites·20 claims
- 0598US9716032B2Via-free interconnect structure with self-aligned metal line interconnectionsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jul 25, 2017·48 cites·15 claims
- 0698US9679100B2Environmental-surrounding-aware OPCTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jun 13, 2017·20 cites·20 claims
- 0798US9390217B2Methodology of optical proximity correction optimizationTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jul 12, 2016·68 cites·20 claims
- 0898US8812999B2Method and system of mask data preparation for curvilinear mask patterns for a deviceTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Aug 19, 2014·58 cites·19 claims
- 0997US11320747B2Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 3, 2022·3 cites·20 claims
- 1097US11243472B2Optical proximity correction and photomasksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Feb 8, 2022·4 cites·20 claims
- 1197US11061318B2Lithography model calibrationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jul 13, 2021·7 cites·20 claims
- 1297US10678142B2Optical proximity correction and photomasksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 9, 2020·13 cites·20 claims
- 1397US9773676B2Lithography using high selectivity spacers for pitch reductionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Sep 26, 2017·17 cites·19 claims
- 1497US9177797B2Lithography using high selectivity spacers for pitch reductionTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Nov 3, 2015·28 cites·20 claims
- 1597US8764995B2Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereofCHANG CHING-HSU·Filed 2010·Granted Jul 1, 2014·305 cites·20 claims
- 1697US8631360B2Methodology of optical proximity correction optimizationWANG HUNG-CHUN·Filed 2012·Granted Jan 14, 2014·34 cites·19 claims
- 1797US8601407B2Geometric pattern data quality verification for maskless lithographyWANG HUNG-CHUN·Filed 2011·Granted Dec 3, 2013·31 cites·20 claims
- 1897US8584052B2Cell layout for multiple patterning technologyCHEN HUANG-YU·Filed 2011·Granted Nov 12, 2013·26 cites·19 claims
- 1997US8507159B2Electron beam data storage system and method for high volume manufacturingWANG HUNG-CHUN·Filed 2011·Granted Aug 13, 2013·29 cites·16 claims
- 2097US8473877B2Striping methodology for maskless lithographyWANG HUNG-CHUN·Filed 2011·Granted Jun 25, 2013·26 cites·20 claims
- 2196US11415890B2Method of mask data synthesis and mask makingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 16, 2022·3 cites·20 claims
- 2296US9793211B2Dual power structure with connection pinsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Oct 17, 2017·13 cites·20 claims
- 2396US9679994B1High fin cut fabrication processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 13, 2017·18 cites·20 claims
- 2496US9529959B2System and method for pattern correction in e-beam lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Dec 27, 2016·27 cites·17 claims
- 2596US9418868B1Method of fabricating semiconductor device with reduced trench distortionsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Aug 16, 2016·11 cites·20 claims
- 2696US9404743B2Method for validating measurement dataTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2012·Granted Aug 2, 2016·62 cites·20 claims
- 2796US9256709B2Method for integrated circuit mask patterningTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Feb 9, 2016·545 cites·20 claims
- 2896US8954899B2Contour alignment systemTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Feb 10, 2015·60 cites·20 claims
- 2996US8841049B2Electron beam data storage system and method for high volume manufacturingTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 23, 2014·28 cites·20 claims
- 3096US8835323B1Method for integrated circuit patterningTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 16, 2014·22 cites·20 claims
- 3196US8627241B2Pattern correction with location effectWANG HUNG-CHUN·Filed 2012·Granted Jan 7, 2014·45 cites·18 claims
- 3296US8468473B1Method for high volume e-beam lithographyWANG HUNG-CHUN·Filed 2012·Granted Jun 18, 2013·34 cites·20 claims
- 3396US8464186B2Providing electron beam proximity effect correction by simulating write operations of polygonal shapesWANG HUNG-CHUN·Filed 2011·Granted Jun 11, 2013·29 cites·20 claims
- 3496US7091502B2Apparatus and method for immersion lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Aug 15, 2006·72 cites·23 claims
- 3595US11789370B2Optical proximity correction and photomasksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 17, 2023·2 cites·20 claims
- 3695US11688730B2Method and system of manufacturing conductors and semiconductor device which includes conductorsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 27, 2023·2 cites·20 claims
- 3795US11675958B2Lithography simulation methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 13, 2023·4 cites·20 claims
- 3895US11092899B2Method for mask data synthesis with wafer target adjustmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 17, 2021·7 cites·20 claims
- 3995US10790155B2Method of manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Sep 29, 2020·7 cites·20 claims
- 4095US9176373B2System and method for decomposition of a single photoresist mask pattern into 3 photoresist mask patternsTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Nov 3, 2015·11 cites·20 claims
- 4195US8943445B2Method of merging color sets of layoutTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jan 27, 2015·29 cites·20 claims
- 4295US8850366B2Method for making a mask by forming a phase bar in an integrated circuit design layoutLIU RU-GUN·Filed 2012·Granted Sep 30, 2014·79 cites·20 claims
- 4395US8739080B1Mask error enhancement factor (MEEF) aware mask rule check (MRC)TAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted May 27, 2014·46 cites·20 claims
- 4494US11004855B2Buried metal track and methods forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted May 11, 2021·7 cites·20 claims
- 4594US10866505B2Mask process correctionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 15, 2020·9 cites·20 claims
- 4694US10497565B2Method for forming semiconductor device structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 3, 2019·7 cites·20 claims
- 4794US10177133B2Semiconductor device including source/drain contact having height below gate stackTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jan 8, 2019·8 cites·20 claims
- 4894US10049918B2Directional patterning methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Aug 14, 2018·9 cites·20 claims
- 4994US10014175B2Lithography using high selectivity spacers for pitch reductionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jul 3, 2018·7 cites·20 claims
- 5094US9431297B2Method of forming an interconnect structure for a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Aug 30, 2016·15 cites·20 claims
Showing the top 50 of 410 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →