Inventor · disambiguated record
Ryo Edo
Also filed as: EDO RYO
9 granted patents·2 pending applications·109 citations·filing 1991–2006
88Inventor score
Files withCANON KK11
Top patents by PatentIndex Score
11 records- 0180US7024266B2Substrate processing apparatus, method of controlling substrate, and exposure apparatusCANON KK·Filed 2002·Granted Apr 4, 2006·22 cites·16 claims
- 0269US7276097B2Load-lock system, exposure processing system, and device manufacturing methodCANON KK·Filed 2004·Granted Oct 2, 2007·13 cites·14 claims
- 0369US6805748B1Substrate processing system with load-lock chamberCANON KK·Filed 2000·Granted Oct 19, 2004·14 cites·6 claims
- 0467US7319507B2Apparatus and method for removing contaminant on original, method of manufacturing device, and originalCANON KK·Filed 2005·Granted Jan 15, 2008·2 cites·14 claims
- 0567US5225686APositioning method and positioning mechanism for use in exposure apparatusCANON KK·Filed 1991·Granted Jul 6, 1993·21 cites·11 claims
- 0666US5800949AMask, method of producing a device using the mask and aligner with the maskCANON KK·Filed 1996·Granted Sep 1, 1998·25 cites·13 claims
- 0759US7236229B2Load lock chamber, processing systemCANON KK·Filed 2004·Granted Jun 26, 2007·7 cites·10 claims
- 0856US7670754B2Exposure apparatus having a processing chamber, a vacuum chamber and first and second load lock chambersCANON KK·Filed 2004·Granted Mar 2, 2010·5 cites·14 claims
- 0947US2006142890A1Substrate processing apparatus, method of controlling substrate, and exposure apparatusCANON KK·Filed 2006·Application pending·0 cites
- 1043US7656507B2Processing unit, exposure apparatus having the processing unit, and protection unitCANON KK·Filed 2006·Granted Feb 2, 2010·0 cites·9 claims
- 1135US2003015290A1Substrate processing apparatus, substrate processing method, and exposure apparatusCANON KK·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →