Inventor · disambiguated record
Ryotaro Hanawa
Also filed as: HANAWA RYOTARO
13 granted patents·70 citations·filing 1988–1996
91Inventor score
Files withSUMITOMO CHEMICAL CO13
Top patents by PatentIndex Score
13 records- 0175US5436107APositive resist compositionSUMITOMO CHEMICAL CO·Filed 1992·Granted Jul 25, 1995·12 cites·8 claims
- 0269US5218136AStyryl compounds, process for preparing the same and photoresist compositions comprising the sameSUMITOMO CHEMICAL CO·Filed 1988·Granted Jun 8, 1993·9 cites·27 claims
- 0367US5792585ARadiation-sensitive positive resist compositionSUMITOMO CHEMICAL CO·Filed 1994·Granted Aug 11, 1998·7 cites·6 claims
- 0449US5736292ARadiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groupsSUMITOMO CHEMICAL CO·Filed 1995·Granted Apr 7, 1998·9 cites·1 claims
- 0545US5362598AQuinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dyeSUMITOMO CHEMICAL CO·Filed 1993·Granted Nov 8, 1994·7 cites·13 claims
- 0643US5198323AResist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation componentSUMITOMO CHEMICAL CO·Filed 1991·Granted Mar 30, 1993·7 cites·13 claims
- 0742US5283324AProcess for preparing radiation sensitive compound and positive resist compositionSUMITOMO CHEMICAL CO·Filed 1992·Granted Feb 1, 1994·6 cites·11 claims
- 0840US5336583APositive quinonediazide resist composition utilizing mixed solvent of ethyl lactate and 2-heptanoneSUMITOMO CHEMICAL CO·Filed 1993·Granted Aug 9, 1994·5 cites·3 claims
- 0939US5587492APolyhydric phenol compound and positive resist composition comprising the sameSUMITOMO CHEMICAL CO·Filed 1995·Granted Dec 24, 1996·4 cites·3 claims
- 1034US5714620APolyhydric phenol compound and positive resist composition comprising the sameSUMITOMO CHEMICAL CO·Filed 1996·Granted Feb 3, 1998·0 cites·5 claims
- 1132US5354644APhotoresist compositions comprising styryl compoundSUMITOMO CHEMICAL CO·Filed 1992·Granted Oct 11, 1994·2 cites·5 claims
- 1231US6383708B1Positive resist compositionSUMITOMO CHEMICAL CO·Filed 1993·Granted May 7, 2002·1 cites·5 claims
- 1331US5783355ARadiation-sensitive positive resist compositionSUMITOMO CHEMICAL CO·Filed 1995·Granted Jul 21, 1998·1 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →