Inventor · disambiguated record
Ryunosuke Handa
Also filed as: HANDA RYUNOSUKE
0 granted patents·7 pending applications·0 citations·filing 2023–2025
Files withSHINETSU CHEMICAL CO7
Top patents by PatentIndex Score
7 records- 0166US2025291245A1Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0264US2024377730A1Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0364US2024345480A1Molecular resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0463US2025244666A1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0562US2024272550A1Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 0653US2024116958A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, Patterning Process, And Semiconductor Photoresist MaterialSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 0749US2025291249A1Resist composition, laminate, and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →